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Search Publications by: John A. Kramar (Fed)

Displaying 51 - 75 of 124

Nanometer Resolution Metrology with the NIST Molecular Measuring Machine

September 23, 2005

Author(s)

John A. Kramar

Nanometre accuracy and resolution metrology over technically relevant areas is becoming a necessity for the progress of nanomanufacturing. At the National Institute of Standards and Technology, we are developing the Molecular Measuring Machine, a scanned

Review of SI Traceable Force Metrology for Instrumented Indentation and Atomic Force Microscopy

September 23, 2005

Author(s)

David B. Newell, John A. Kramar, Jon R. Pratt, Douglas T. Smith

This paper reviews the current status of small force metrology for quantitative instrumented indentation and atomic force microscopy (AFM), and in particular focuses on new electrical and deadweight standards of force developed at the National Institute of

Active Vibration Isolation of a Large Stroke Scanning Probe Microscope by Using Discrete Sliding Mode Control

May 31, 2005

Author(s)

J Y. Yen, K J. Lan, John A. Kramar

Active vibration isolation is gaining increased attention in the ultra high precision applications to effectively treat the unavoidable ground vibration. The use of active vibration isolation is now being explored for the Molecular Measuring Machine (M 3)

Metrologies for Quantitative Nanomechanical Testing and Quality Control in Semiconductor Manufacturing

February 1, 2005

Author(s)

Jon R. Pratt, John A. Kramar, David B. Newell, Douglas T. Smith

If nanomechanical testing is to evolve into a tool for process and quality control in semiconductor fabrication, great advances in throughout, repeatability, and accuracy of the associated instruments and measurements will be required. A recent grant

Sliding Mode Control for Active Vibration Isolation of a Long Range Scanning Tunneling Microscope

October 29, 2004

Author(s)

K J. Lan, James H. Yen, John A. Kramar

An active vibration isolation (AVI) system has been designed and implemented for the Molecular Measuring Machine (M3) at the National Institute of Standards and Technology (NIST). NIST is investigating active vibration isolation as an approach to improving

Realizing and Disseminating the SI Micronewton With the Next Generation NIST Electrostatic Force Balance

October 1, 2004

Author(s)

Richard Seugling, David B. Newell, John A. Kramar, Jon R. Pratt

The NIST Electrostatic Force Balance (EFB) compares deadweight and mechanical probe forces to an SI realization of force derived from measurements of the capacitance gradient and voltage in an electronic null balance. In the following abstract, we briefly

Active Vibration Isolation for a Long-Range Scanning Tunneling Microscope

June 1, 2004

Author(s)

K J. Lan, J Y. Yen, John A. Kramar

Vibration Isolation or control is critical for the optimum operation of the Molecular Measuring Machine (M3), a high-resolution, length-metrology instrument at the National Institute of Standards and Technology. This paper describes the extension of the M3

Progress Towards SI Traceable Force Metrology for Nanomechanics

January 1, 2004

Author(s)

David B. Newell, Eric P. Whitenton, John A. Kramar, Jon R. Pratt, Douglas T. Smith

This paper is based, in its entirety, on NIST-approved publications: Calibration of Piezoresistive Cantilever Force Sensors Using the NIST Electrostatic Force Balance, The NIST Electrostatic Force Balance Experiment, The NIST Microforce Realization and

Progress Towards Systeme International d'Unites Traceable Force Metrology for Nanomechanics

January 1, 2004

Author(s)

Jon R. Pratt, Douglas T. Smith, David B. Newell, John A. Kramar, Eric P. Whitenton

Recent experiments with the National Institute of Standards and Technology (NIST) Electrostatic Force Balance (EFB) have achieved agreement between an electrostatic force and a gravitational force of 10^(-5) N to within a few hundred pN/¿N. This result

Calibration of Piezoresistive Cantilever Force Sensors Using the NIST Electrostatic Force Balance

November 16, 2003

Author(s)

Jon R. Pratt, David B. Newell, John A. Kramar, Eric P. Whitenton

The characterization of material properties and mechanical performance of micro-electromechanical devices often hinges on the accurate measurement of small forces. Calibrated load cells of appropriate size and range are used, but are often not calibrated

Dependence of Morphology on Miscut Angle for Si(111) Etched in NH(4)F

May 1, 2003

Author(s)

S Gonda, Joseph Fu, John A. Kramar, Richard M. Silver, Hui Zhou

Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH(4)F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the number of

Dependency of Morphology on Miscut Angle for Si(111) Etched in NH 4 F

May 1, 2003

Author(s)

Joseph Fu, Hui Zhou, John A. Kramar, Richard M. Silver, S Gonda

Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH 4F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the number of

The NIST Microforce Realization and Measurement Project

April 1, 2003

Author(s)

David B. Newell, Edwin R. Williams, John A. Kramar, Jon R. Pratt, Douglas T. Smith

The National Institute of Standards and Technology (NIST) has launched a five-year Micro-force Realization and Measurement project focusing on the development of an instrument and laboratory capable of realizing and measuring the SI unit of force below