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Search Publications by: Ronald G. Dixson (Fed)

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Displaying 1 - 25 of 277

Traceable localization enables accurate integration of quantum emitters and photonic structures with high yield

March 18, 2024
Author(s)
Craig R. Copeland, Adam L. Pintar, Ronald G. Dixson, Ashish Chanana, Kartik Srinivasan, Daron Westly, Robert Ilic, Marcelo Davanco, Samuel M. Stavis
In a popular integration process for quantum information technologies, localization microscopy of quantum emitters guides lithographic placement of photonic structures. However, a complex coupling of microscopy and lithography errors degrades registration

Sub-picoliter Traceability of Microdroplet Gravimetry and Microscopy

December 20, 2021
Author(s)
Lindsay C. C. Elliott, Adam L. Pintar, Craig R. Copeland, Thomas Brian Renegar, Ronald G. Dixson, Robert Ilic, R. Michael Verkouteren, Samuel M. Stavis
Volumetric analysis of single microdroplets is difficult to perform by ensemble gravimetry, whereas optical microscopy is often inaccurate beyond the resolution limit. To address the latter issue, we advance and integrate these complementary methods

Wear comparison of critical dimension-atomic force microscopy tips

March 28, 2020
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, Ernesto Lopez, Bernd Imer
Nanoscale wear affects the performance of atomic force microscopy (AFM)-based measurements for all applications including process control, nanoelectronics characterization and topography measurements. As such, methods to prevent or reduce AFM tip wear is

Spatial Dimensions in Atomic Force Microscopy: Instruments, Effects, and Measurements

August 15, 2018
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Ichiko Misumi, Gaoliang Dai
Atomic force microscopes (AFMs) are commonly and broadly regarded as being capable of three dimensional imaging. However, conventional AFMs suffer from both significant functional constraints and imaging artifacts that render them less than fully three

Contour Metrology using Critical Dimension Atomic Force Microscopy

December 15, 2016
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, Boon Ping Ng, Andras Vladar, Michael T. Postek
The critical dimension atomic force microscope (CD-AFM) has been proposed as an instrument for contour measurement and verification – since its capabilities are complementary to the widely used scanning electron microscope (SEM). Although data from CD-AFM