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Detecting nanoscale contamination in semiconductor fabrication using through-focus scanning optical microscopy

Published

Author(s)

Min-Ho Rim, Emil Agocs, Ronald G. Dixson, Premsagar P. Kavuri, Andras Vladar, Ravikiran Attota
Citation
Journal of Vacuum Science and Technology B

Keywords

Semiconductor fabrication, contamination, detection, defects, TSOM

Citation

Rim, M. , Agocs, E. , Dixson, R. , Kavuri, P. , Vladar, A. and Attota, R. (2020), Detecting nanoscale contamination in semiconductor fabrication using through-focus scanning optical microscopy, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=928754 (Accessed December 3, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created August 27, 2020, Updated October 12, 2021