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Search Publications by: Eric L. Shirley (Fed)

Displaying 76 - 100 of 185

Anharmonic effects on infrared spectra of GaAs and GaP: First-principles calculations

January 1, 2004

Author(s)

H M. Lawler, Eric L. Shirley

Diffraction Corrections In Radiometry: Spectral and Total Power, and Asymptotic Properties

January 1, 2004

Author(s)

Eric L. Shirley

Diffraction Effects on Broadband Radiation: Formulation For Computing Total Irradiance

January 1, 2004

Author(s)

Eric L. Shirley

Effect of Coupling of Forward- and Backward-Going Electron-Hole Pairs on the Static Local-Field Factor of Jellium

January 1, 2004

Author(s)

A Tsolakidis, Eric L. Shirley, R M. Martin

Effect of the Coupling of the Forward- and Backward-Going Electron-Hole Pairs on the Static Local Field-Factor of Jellium

January 1, 2004

Author(s)

A Tsolakidis, Eric L. Shirley, R M. Martin

We investigate the effect of the coupling of the forward- and backward-going electron-hole pairs on the static local-field factor of jellium with and without a gap. We calculate the static local-field factor for the two types of jellium as a function of q

Intuitive Diffraction Model for Multistaged Optical Systems

January 1, 2004

Author(s)

Eric L. Shirley

Ionic Displacement Correlations From The Zero-Point Motion of Pressurized Solid Argon

January 1, 2004

Author(s)

H M. Lawler, E K. Chang, Eric L. Shirley

Li 1s Near-Edge Spectra In Six Lithium Halides

January 1, 2004

Author(s)

Eric L. Shirley

Ti ls Pre-Edge Features In Rutile: A Bethe-Salpeter Calculation

January 1, 2004

Author(s)

Eric L. Shirley

Photoelastic and Elastic Properties of the Fluorite Structure Materials, LiF, and Si

October 1, 2003

Author(s)

Zachary H. Levine, John H. Burnett, Eric L. Shirley

We present computational results of the photoelastic and elastic properties of calcium fluoride, strontium fluoride, barium fluoride, lithium fluoride, and silicon. We also present measurements of the photoelastic properties in the visble through the

Electron Self-Energy Calculation Using a General Multi-Pole Approximation

May 1, 2003

Author(s)

J A. Soininen, J J. Rehr, Eric L. Shirley

We present a method for calculating the inverse of the dielectric matrix in a solid using a Band-Lanczos algorithm. The method produces a multi-pole approximation for the inverse dielectrix matrix with an arbitrary number of poles. We discuss how this

Accurate Efficient Evaluation of Lommel Functions for Arbitrarily Large Arguments

February 1, 2003

Author(s)

Eric L. Shirley, E K. Chang

It can be difficult to evaluate Lommel functions U_n(u,v) and V_n(u,v) when u and v are both large. Here, we present an accurate means to evaluate such functions using contour integration. The approach suggests the potential for developing analogous

Accurate Efficient Evaluation of Lommel Functions for Arbitrarily Large Arguments

January 1, 2003

Author(s)

E K. Chang, Eric L. Shirley

Accurate Efficient Evaluation of Lommel Functions for Arbitrarily Large Arguments

January 1, 2003

Author(s)

Eric L. Shirley, E K. Chang

Electron Self-energy Calculation using a General Multi-pole Approximation

January 1, 2003

Author(s)

J J. Rehr, J A. Soininen, Eric L. Shirley

Electron Self-Energy Calculation Using a General Multi-Pole Approximation

January 1, 2003

Author(s)

J A. Soininen, J J. Rehr, Eric L. Shirley

Photoelastic and elastic properties of fluorite structure materials, LiF, and silicon

January 1, 2003

Author(s)

Zachary H. Levine, John H. Burnett, Eric L. Shirley

Photoelastic and Elastic Properties of The Fluorite Structure Materials, LiF, and Si

January 1, 2003

Author(s)

Zachary H. Levine, J H. Burnett, Eric L. Shirley

The photoelastic and elastic properties of the fluorite structure materials, LiF, and Si

January 1, 2003

Author(s)

Zachary H. Levine, John H. Burnett, Eric L. Shirley

Symmetry of Spatial-Dispersion-Induced Birefringence and its Implications for CaF 2 Ultraviolet Optics

August 1, 2002

Author(s)

John H. Burnett, Zachary H. Levine, Eric L. Shirley, J H. Bruning

The discovery of a large intrinsic birefringence in CaF 2 at ultraviolet wavelengths has had a major impact on the design of 157 nm lithography systems, requiring complete redesign of the optics to take account of the imaging aberrations resulting from the

Ab Initio Calculation of KLV Auger Spectra in Si

July 1, 2002

Author(s)

E K. Chang, Eric L. Shirley

We present an ab initio Green's function formalizm for predicting CCV Auger spectra for solids. The formalizm takes into account core-hole screening final-state interaction effects, and angular-momentum dependence. it is applied to calculate the KLV Auger

Momentum Dependence of Fluorine K-Edge Core Exciton in LiF

April 1, 2002

Author(s)

K Hamalainen, S Galambosi, J A. Soininen, Eric L. Shirley, A Shukla, J P. Rueff

Non-resonant inelastic x-ray scattering spectra have been measured with an energy loss close to the fluorine K-edge of lithium fluoride. The extracted dynamic structure factor is well reproduced by an ab initio computational scheme that takes the electron

Orbital-Resolved Soft X-Ray Spectroscopy in NaV 2 O 5

April 1, 2002

Author(s)

G P. Zhang, G T. Woods, Eric L. Shirley, T A. Callcott, L Lin, B. C. Sales, D Mandrus, G S. Chang, J He

We demonstrate that angle-resolved soft x-ray spectroscopy can resolve absorption by inequivalent oxygen sites and by different orbitals belonging to the same site. By rotating the polarization direction, we see a dramatic change in the absorption spectra

The Trouble with Calcium Floride

March 1, 2002

Author(s)

John H. Burnett, Zachary H. Levine, Eric L. Shirley

We discuss the intrinsic birefringence of calcium fluoride and othercrystalline materials that may be used in the optics for 193nm and 157nmlithography, including the characterization of the effect and itsimplications for performance of lens systems at

Intrinsic Birefringence in Crystalline Optical Materials: A New Concern for Lithography

February 1, 2002

Author(s)

John H. Burnett, Zachary H. Levine, Eric L. Shirley

Crystalline optical materials, such as CaF2, expected to be used in193nm and 157nm lithography systems, turn out to have large, intrinsicbirefringences which must be carefully accounted for in the lithographyoptics design.We recently reported intrinsic