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Search Publications by: Yicheng Wang (Fed)

Displaying 76 - 100 of 134

Collisional Decomposition of SF 6

September 1, 2000

Author(s)

R. Champion, I. V. Dyakov, Yicheng Wang

Insulating gas mixtures containing SF 6 have been promoted to serve as replacements for pure SF 6 in order to reduce SF 6 atmospheric emission. It has been argued that some synergism may be achieved by choosing proper buffer gases in mixtures with SF 6

Mass-resolved Studies of Positive Ions in High Density Plasmas Generated in CHF3, C2F6, and CH2FCF3 and Their Mixtures with Ar

September 1, 2000

Author(s)

Yicheng Wang, Amanda N. Goyettes, Martin Misakian, James K. Olthoff

We have determined the relative abundances and energy distributions of positive ions in high density plasmas generated in CHF 3, C 2F 6 and CH 2FCF 3 and their mixtures with Ar using an ion energy analyzer-mass spectrometer appended to the lower electrode

Inductively Coupled Plasmas in Low Global Warming Potential Gases

August 1, 2000

Author(s)

Amanda N. Goyettes, Yicheng Wang, James K. Olthoff

Many high density discharges used in microelectronics fabrication use fluorocarbon gases with coincidentally high global-warming potentials (GWPs). We have determined the identities, fluxes, and energy distributions of ions produced in high density

Calculation of Ion Energy Distributions from Radio Frequency Plasmas Using a Simplified Kinetic Approach

April 1, 2000

Author(s)

Martin Misakian, Yicheng Wang

Using an elementary kinetic approach, a procedure is described for calculating ion energy distributions (IEDs) from radio frequency (rf) plasmas. The calculated distributions, which are in the form of histograms, are used to fit experimental argon and CF 3

Time-resolved Measurements of Ion Energy Distributions and Optical Emissions in Pulsed Radio-Frequency Discharges

March 1, 2000

Author(s)

Yicheng Wang, Eric C. Benck, Martin Misakian, M. Edamura, James K. Olthoff

In pulse-modulated inductively coupled plasmas generated in CF 4:Ar mixtures, a transition between a capacitive coupling mode (E mode) and an inductive coupling mode (H mode) was observed. For a pulsed plasma in a 50%CF 4:50%Ar volume mixture with the peak

Studies of Ion Bombardment in High Density Plasmas Containing CF 4

July 1, 1999

Author(s)

James K. Olthoff, Yicheng Wang

We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure C 4

Electron Drift and Attachment in CHF 3 and its Mixtures With Argon

May 1, 1999

Author(s)

Yicheng Wang, Loucas G. Christophorou, James K. Olthoff, J. K. Verbrugge

Measurements are reported of the electron drift velocity, w, in CHF 3 gas and in its mixtures with argon. The E/N dependence of w in the mixtures exhibits regions of distinct negative differential conductivity. A small electron attachment rate constant (-

Ion Energy Distributions in Inductively Coupled Radio-Frequency Discharges in Argon, Nitrogen, Oxygen, Chlorine, and Their Mixtures

May 1, 1999

Author(s)

Yicheng Wang, James K. Olthoff

We report ion energy distributions, relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively-coupled Gaseous Electronics Conference radio-frequency reference cell for discharges generated in pure argon

Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor

April 1, 1999

Author(s)

Mark A. Sobolewski, James K. Olthoff, Yicheng Wang

Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively-Coupled, High-Density Plasma Reactor

April 1, 1999

Author(s)

Mark A. Sobolewski, James K. Olthoff, Yicheng Wang

Ion energy distributions were measured at a grounded surface in an inductively-coupled, high-density plasma reactor for pure argon, argon-helium, and argon-xenon discharges at 1.33 Pa (10 mTorr), as a function of radio-frequency (rf) bias amplitude, rf

Low Energy, Ion-Induced Electron and Ion Emission from Stainless Steel: The Effect of Oxygen Coverage and the Implications for Discharge Modeling

February 1, 1999

Author(s)

S. G. Walton, J. C. Tucek, R. Champion, Yicheng Wang

Absolute yields of electrons and negative ions resulting from positive ions impacting stainless steel have been determined as a function of impact energy for clean and oxygen-covered surfaces. Photoelectron emission has been used to monitor the effect of

Analysis of the Degradation of Polyethylene in Air Using Electrical and Physical Data

December 1, 1998

Author(s)

J. C. Horwath, D. L. Schweickart, Yicheng Wang

Discharge currents and degradation of polyethylene from high dc electric field stress in air were investigated. A positive point-to-plane configuration was used with thin polyethylene samples on the cathode surface. Voltage, spacing and relative humidity

Characteristics of Partial Discharges on a Dielectric Surface in SF 6 -N 2 Mixtures

December 1, 1998

Author(s)

X. Han, Yicheng Wang, Loucas G. Christophorou, Richard J. Van Brunt

An important tool for improving the reliability of HV-insulation systems relies on partial discharge (PD) measurements. The assessment of the insulation failure of HV equipment using PD measurements requires an interpretation of the PD measurements