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Search Publications by: Christopher Soles (Fed)

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Displaying 101 - 125 of 166

Correlation of the Reaction Front With Roughness in Chemically Amplified Photoresists

July 1, 2004
Author(s)
Ronald L. Jones, Vivek M. Prabhu, D M. Goldfarb, Eric K. Lin, Christopher L. Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, M Angelopoulos
A model bilayer geometry is used to examine fundamental contributions of in-situ reaction front profile width on resulting line edge roughness after development in standard 0.26 N tetramethyl ammonium hydroxide aqueous base developer. The bilayer geometry

Structure Characterization of Porous Interlevel Dielectric Films

June 21, 2004
Author(s)
Wen-Li Wu, Eric K. Lin, Christopher L. Soles
To extend the dielectric constant of interlevel dielectrics below a value of ~2.6 seen in today s IC chips, porous low-k material has been evaluated as a viable candidate by industries. In this paper, the current status and the future need in metrologies

Interfacial Effects on Moisture Absorption in Thin Polymer Films

June 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, C M. Wang, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, D L. Goldfarb, M Angelopoulos
Moisture absorption in model photoresist films of poly(4-hydroxystryene) (PHOSt) and poly(tert-butoxycarboxystyrene) (PBOCSt) was measured by x-ray and neutron reflectivity. The degree of swelling in the films upon moisture exposure was found to be

X-Ray and Neutron Porosimetry as Powerful Methodologies for Determining Structural Characteristics of Porous Low-k Thin Films

June 1, 2004
Author(s)
Hae-Jeong Lee, B D. Vogt, Christopher L. Soles, Da-Wei Liu, Barry J. Bauer, Wen-Li Wu, Eric K. Lin, Gwi-Gwon Kang, Min-Jin Ko
Methylsilsesquioxane based porous low-k dielectric films with varying porogen loading have been characterized using X-ray and neutron porosimetry to determine their pore size distribution, average density, wall density, porosity, density profiles, and

Comparative Specular X-Ray Reflectivity, Positron Annihilation Lifetime Spectroscopy, and Incoherent Neutron Scattering Measurements of the Dynamics in Thin Polycarbonate Films

April 1, 2004
Author(s)
Christopher L. Soles, Jack F. Douglas, Wen-Li Wu, H G. Peng, D W. Gidley
The manner in which the dynamics of a polymer are affected by thin film confinement is one of technological significance, impacting thin film applications such as lubricants, adhesives, and chemically amplified photoresists. In this manuscript we use

Unusual Expansion and Contraction in Ultrathin Glassy Polycarbonate Films

April 1, 2004
Author(s)
Christopher L. Soles, Jack F. Douglas, Ronald L. Jones, Wen-Li Wu
The thermal expansion behavior and glass transitions of poly(styrene) (PS) and poly(methyl methacrylate) (PMMA) are extensively studied in the thin film geometry. Both PS and PMMA are similar in that they possess very low entanglement densities. In this

Brillouin Scattering Studies of Polymeric Nanostructures

March 1, 2004
Author(s)
R Hartschuh, A Mahorowala, Y Ding, J H. Roh, A Kisliuk, Alexei Sokolov, Christopher Soles, Ronald L. Jones, T J. Hu, Wen-Li Wu
Polymers are now being patterned into nanometer-sized features via optical and/or imprint lithography for a range of applications, including semiconductors, Micro-Electro- Mechanical systems (MEMS), and Nano-Electro-Mechanical systems (NEMS). In these

Pore Size Distributions in Low-k Dielectric Thin Films From SANS Porosimetry

March 1, 2004
Author(s)
R C. Hedden, V. J. Lee, Christopher L. Soles, Barry J. Bauer
A small-angle neutron scattering (SANS) porosimetry technique is presented for characterization of pore structure in nanoporous thin films. Porosimetry experiments are conducted using a contrast match solvent (a mixture of toluene-d8 and toluene-h8) having

Water Absorption in Thin Photoresist Films

February 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, Vivek M. Prabhu, Wen-Li Wu, Eric K. Lin
In this work, we quantify deviations in the moisture absorption into model photoresist films upon changing thickness. Both the thermodynamics and kinetics of the absorption process are examined. Water in the resist films has been shown to have a

Interdiffision in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface

September 10, 2003
Author(s)
Chengqing C. Wang, Vivek M. Prabhu, Christopher L. Soles, B D. Vogt, Wen-Li Wu, Eric K. Lin, Sushil K. Satija
Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prepared

Confinement Effects on Mositure Absorption Kinetics in Polyelectrolyte Films

September 1, 2003
Author(s)
B D. Vogt, Christopher L. Soles, Hae-Jeong Lee, Eric K. Lin, Wen-Li Wu
Quartz crystal microbalance (QCM) measurements were used to determine the absorption of water into thin poly(4-ammonium styrenesulfonic acid) films from saturated vapor at 25 C. The effect of film thickness on the absorption kinetics was investigated in

Fast Evaluation of Next-Generation Lithographical Patterns by Small Angle X-Ray Scattering

September 1, 2003
Author(s)
T Hu, Ronald L. Jones, Wen-Li Wu, Christopher L. Soles, Eric K. Lin, M Arpan, D M. Casa
As the semiconductor industry moves to next-generation lithographies, evaluation of the patterns is more stringent. We demonstrate the capability of small angel X-ray scattering in a fast evaluation of periodicity, size of the patterns, average profile of

Form of Deprotection in Chemically Amplified Resists

September 1, 2003
Author(s)
Ronald L. Jones, T J. Hu, Vivek M. Prabhu, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
The push to mass production of patterns with sub-100 nm dimensions will require nanometer level control of feature size, including line edge roughness (LER). Control of LER and sidewall roughness within the length scale of individual molecules requires a

Interdiffusion in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface

September 1, 2003
Author(s)
C M. Wang, Vivek Prabhu, Christopher Soles, B D. Vogt, Wen-Li Wu, Eric K. Lin, Sushil K. Satija
Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prepared