October 2, 2015
Author(s)
James Alexander Liddle, Jeffrey Elam, Mahua Biswas, Seth B. Darling, Angel Yanguas-Gil, Jonathan Emery, Alex Martinson, Paul Nealey, Tamar Segal-Peretz, Qing Peng, Jonathan P. Winterstein, Y. C. Tseng
Sequential infiltration synthesis (SIS) is a process derived from ALD in which a polymer is infused with inorganic material using sequential, self-limiting exposures to gaseous precursors. SIS can be used in lithography to harden polymer resists rendering