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Search Publications by: James Alexander Liddle (Fed)

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Displaying 76 - 100 of 119

Quantum Dot Fluorescence Lifetime Engineering with DNA Origami Constructs

January 21, 2013
Author(s)
James A. Liddle, Seung-Hyeon Ko, Kan Du
The ability to organize nanostructures of disparate types and materials – such as metal nanoparticles and semiconductor quantum dots – is challenging but essential for the creation of novel materials and devices. Metal nanoparticles (NPs) have interesting

Quantum Dot-DNA Origami Binding : A Single Particle, 3D, Real-Time Tracking Study

January 2, 2013
Author(s)
Kan K. Du, Seung-Hyeon Ko, Gregg M. Gallatin, Heayoung Yoon, James Alexander Liddle, Andrew J. Berglund
The binding process of quantum dots and DNA origami was monitored using a 3D, real-time, single-particle tracking system. Single-molecule binding events were directly observed and precise measurements of the diffusion coefficient and second-order photon

DNA Evolves

December 1, 2012
Author(s)
James A. Liddle, Seung-Hyeon Ko
None

Multiple electrokinetic actuators for feedback control of colloidal crystal size

July 27, 2012
Author(s)
Jaime Juarez, Pramod Mathai, James Alexander Liddle, Michael Bevan
We report a feedback method for controlling the sizes of hexagonally close packed two-dimensional colloidal crystals in a microfluidic quadrupole electrode device. Crystal size, measured by the number of colloidal particles comprising the crystal, is

Three-dimensional real-time tracking of nanoparticles at an oil-water interface

June 5, 2012
Author(s)
Kan K. Du, James A. Liddle, Andrew J. Berglund
We show that real-time feedback control can be used to study three-dimensional nanoparticle transport dynamics. We apply the method to study the behavior of adsorbed nanoparticles at a silicone oil-water interface in a microemulsion system over a range of

Lithography, Metrology and Nanomanufacturing

April 12, 2011
Author(s)
James A. Liddle, Gregg M. Gallatin
Semiconductor chip manufacturing is by far the predominant nanomanufacturing technology in the world today. Top-down lithography techniques are used for fabrication of logic and memory chips since, in order to function, these chips must essentially be

Nanoelectronics Lithography

March 1, 2011
Author(s)
Stephen Knight, Vivek Prabhu, John H. Burnett, James Alexander Liddle, Christopher Soles, Alain C. Diebold
This is a compiled chapter that will be included into the Handbook of Nanophysics.

Spatial Coherence in Electron-Beam Patterning

September 27, 2010
Author(s)
Ginusha M. Perera, Gila E. Stein, James Alexander Liddle
We demonstrate a simple method to identify noise sources in electron-beam systems and accurately quantify the resulting errors in feature placement. Line gratings with a 46 nm average pitch were patterned with electron-beam lithography (EBL) and measured