October 6, 2005
Author(s)
Seongshik Oh, Dustin P. Hite, Katarina Cicak, Kevin Osborn, Raymond W. Simmonds, Robert Mcdermott, Ken B. Cooper, Matthias Steffen, John M. Martinis, David P. Pappas
We have grown epitaxial renium (0001) films on α-Al 2O 3(0001) substrates using sputter deposition in an ultra high vacuum system. We find that better epitaxy is achieved with DC rather than with RF sputtering. With DC sputtering, epitaxy is obtained with