U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Search Publications by: Kerry Siebein (Fed)

Search Title, Abstract, Conference, Citation, Keyword or Author
Displaying 1 - 8 of 8

Optimization of 6 LiF:ZnS(Ag) Scintillator Light Yield using GEANT4

June 1, 2018
Author(s)
Y. Yehuda-Zada, Kevin N. Pritchard, Jeffrey B. Ziegler, P. Yvonne Barnes, Kerry Siebein, M. Jackson, C. Hurlbut, Y. Kadmon, Y. Cohen, R. M. Ibberson, Charles Majkrzak, Nicholas C. Maliszewskyj, I. Orion, A. Osovizky
A new cold neutron detector has been developed at the NCNR for the CANDoR project. Geometric and performance constraints dictate that this detector be exceptionally thin (2nm). For this reason, the design of the detector consists of 6LiF:ZnS(Ag)

6 LiF:ZnS(Ag) Mixture Optimization for a Miniature Highly Efficient Cold Neutron Detector

April 2, 2018
Author(s)
A. Osovizky, Kevin N. Pritchard, Jeffrey B. Ziegler, Louis E. Binkley, Y. Yehuda-Zada, Peter NMN Tsai, Alan Keith Thompson, P. Yvonne Barnes, Kerry Siebein, Nancy Hadad, M. Jackson, C. Hurlbut, R. Ibberson, George M. Baltic, Charles Majkrzak, Nicholas C. Maliszewskyj
We report the optimization of a ^6^LiF:ZnS(Ag) scintillator mixture for an ultrathin (2nm), highly efficient cold neutron dector. Preliminary results with early protypes demonstrate excellent for 3.62 meV (4.75 Angstrom wavelenght) neutrons but mediocre

High Quality Oxide Films Deposited at Room Temperature by Ion Beam Sputtering

February 5, 2018
Author(s)
Gerard E. Henein, Juraj Topolancik, Kerry NMN Siebein
SiO2, Al2O3 and ITO have been deposited via ion beam sputtering at room temperature. The SiO2 films, 100 nm thick, were highly insulating with a resistivity of 10 16 Ω·m and breakdown field in excess of 7x108 V/m. The Al2O3 films, 3 to 4 nm in thickness