Wang, B.
, Suehle, J.
, Vogel, E.
and Bernstein, J.
(2001),
Time Dependent Breakdown of Ultra-Thin Gate Dielectrics Under Pulsed Biased Stress, IEEE Electron Device Letters
(Accessed July 27, 2024)
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.