Traceable GISAXS measurements for pitch determination of a 25 nm self-assembled polymer grating

Published

December 17, 2014

Author(s)

Jan Wernecke, Michael Krumrey, Armin Hoell, Regis J. Kline, Hung-Kung Liu, Wen-Li Wu

Abstract

The feature sizes of only a few nanometers in modern nanotechnology and next generation microelectronics continually increase the demand for suitable nanometrology tools. Grazing incidence small-angle X-ray scattering (GISAXS) is a versatile technique to measure lateral and vertical sizes in the nm-range, but the traceability of the obtained parameters, which is a prerequisite for any metrological measurement, has not been demonstrated so far. In this work, the first traceable GISAXS measurements, demonstrated with a self-assembled block copolymer grating structure with a nominal pitch of 25 nm, are reported. The different uncertainty contributions to the obtained pitch value of 24.83(9) nm are determined one by one and are discussed. The main uncertainty contribution results from the sample-detector distance and the pixel size measurement, whereas the intrinsic asymmetry of the scattering features is of minor relevance for the investigated grating structure. The uncertainty analysis provides a basis for the evaluation of the uncertainty of GISAXS data in a more general context, for example in numerical data modeling.

Citation

Journal of Applied Crystallography

Pub Type

Journals

Citation

Wernecke, J. , Krumrey, M. , Hoell, A. , Kline, R. , Liu, H. and Wu, W. (2014), Traceable GISAXS measurements for pitch determination of a 25 nm self-assembled polymer grating, Journal of Applied Crystallography (Accessed December 17, 2024)