HighRI Optics, Inc will develop cutting-edge technology for instrument transfer function (ITF) calibration of extreme ultraviolet (EUV) lithographic tools to enhance the performance and precision of EUV tools utilized in semiconductor manufacturing.
The awardee with develop cutting-edge technology for instrument transfer function (ITF) calibration of extreme ultraviolet (EUV) lithographic tools.
The proposed technology will enhance the performance and precision of extreme ultraviolet equipment.
Researchers and U.S. semiconductor industry that utilizes extreme ultraviolet (EUV) lithographic tools.
The recipient plans to subaward funds to support fabrication and characterization of x-ray optical devices and EUV lithography and photomask development, along with technical consulting services.
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