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Nanotechnology

Tools and Instruments

Keyword

Organizational Unit

NanoFab Tool: Microprocess Technology Avenger Spray Solvent Lift-off Tool

The Microprocess Technology Avenger spray solvent lift-off tool uses a heated spray solvent to remove residual material and photoresist after deposition of a

Photograph of the Nanonex NX-2000 Nano-Imprint Lithography System.

NanoFab Tool: Nanonex NX-2000 Nanoimprint Lithography (NIL) System

The Nanonex NX-2000 Nanoimprinter provides users with the capability to replicate surface patterns with feature sizes down to 10 nm over large areas at a low

Photograph of the Nikon L200 compound optical microscope.

NanoFab Tool: Nikon L200 Compound Optical Microscope

The Nikon L200 is a compound optical microscope that supports both reflected light and transmitted light modes for inspecting substrates and samples. The

Photograph of the Oxford Plasmalab 100 inductively coupled plasma etcher.

NanoFab Tool: Oxford Plasmalab 100 Inductively Coupled Plasma (ICP) Silicon Etcher

The Oxford Plasmalab 100 inductively coupled plasma (ICP) etcher is a multipurpose fluorocarbon based system that provides users anisotropic etching of silicon

NanoFab Tool: Oxford Plasmalab 100 Inductively Coupled Plasma (ICP) Metal Etcher

The Oxford Plasmalab 100 inductively coupled plasma (ICP) etcher is a multipurpose chlorine based system that provides users with selective etching of III-V

NanoFab Tool: Oxford Plasmalab 100 Plasma Enhanced Chemical Vapor Deposition

The Oxford PlasmaLab 100 is a plasma-enhanced chemical vapor deposition (PECVD) system used to deposit a variety of thin films on to a substrate material. The

NanoFab Tool: Oxford PlasmaPro 100 Inductively Coupled Plasma (ICP) Etcher 3

NanoFab Tool: Oxford PlasmaPro 100 Inductively Coupled Plasma (ICP) III-V Etcher

The Oxford PlasmaPro100 ICP etcher is configured for etching of III-V group semiconductors (InP and GaAs) using a chlorine gas-based plasma etch chemistry. The

NanoFab Tool: Plasma-Therm Versaline High Density Plasma Enhanced Chemical Vapor Deposition (HD-PECVD)

The Plasma-Therm Versaline high density plasma enhanced chemical vapor deposition (HD-PECVD) system uses an inductively coupled plasma to remotely ionize

Photograph of the Unaxis 790 reactive ion etcher.

NanoFab Tool: Reactive Ion Etcher Unaxis 790 Middle

The Unaxis 790 reactive ion etcher (RIE) is a general purpose parallel plate plasma etching system which uses ionized fluorocarbon gases and oxygen to etch

Photograph of the Reynolds Tech silicon nitride etch wet bench.

NanoFab Tool: Reynolds Tech Silicon Nitride Etch Wet Bench

The Reynolds Tech silicon nitride etch wet bench uses dilute phosphoric acid to preferentially etch silicon nitride on silicon. The process is used to define

NanoFab Tool: Specialty Coating Systems PDS 2010 Parylene Deposition System

The Specialty Coating Systems PDS 2010 parylene deposition system provides users with reliable and repeatable conformal parylene coatings ranging from 75

Photograph of the SPTS Etch hydrofluoric acid vapor etcher

NanoFab Tool: SPTS microEtch Hydrofluoric Acid Vapor Etcher

The SPTS µEtch is a single wafer hydrofluoric acid vapor etcher used to release silicon microstructures in microelectromechanical systems (MEMS) devices. It

Photograph of the SPTS Omega c2L Rapier deep silicon etcher.

NanoFab Tool: SPTS Omega c2L Rapier Deep Silicon Etcher

The SPTS Omega c2L Rapier deep silicon etcher is an inductively coupled plasma (ICP) etching system used for etching deep features in silicon. The tool uses a

Schematic of the Suss MicroTec ACS200 Resist Coat System

NanoFab Tool: Suss MicroTec ACS200 Automated Resist Coater

The Suss MicroTec ACS200 is an automated photoresist coating and baking station with cassette-to-cassette substrate operation. It supports both spin coating and

Schematic of the Suss MicroTec Delta12 Developer System.

NanoFab Tool: Suss MicroTec Delta12AQ Automated Resist Developer

The Suss MicroTec Delta12AQ is an automated photoresist developer station which supports temperature controlled spray photoresist development. The cassette-to

NanoFab Tool: Suss MicroTec MA/BA6 Gen4 Mask Aligner

The SUSS MicroTec MA/BA6 contact aligner allows users to align patterns on the front or back of a substrate and to print feature sizes down to 1 µm. The tool

NanoFab Tool: Toho Technology FLX-2320 Stress Measurement Tool

The Toho Technology FLX-2320 stress measurement tool uses a laser interferometer to measure the curvature of a wafer before and after film deposition. It then

Photograph of the Tousimis Automegasamdri-916B Series C critical point dryer.

NanoFab Tool: Tousimis Automegasamdri-916B Series C

The Tousimis Supercritical Automegasamdri-916B Series C critical point dryer uses liquid carbon dioxide (LCO 2) to dry substrates in a controlled manner in

Photograph of the Tresky T-3000-FC3-HF flip chip bonder.

NanoFab Tool: Tresky T-3000-FC3-HF Flip Chip Bonder

The Tresky T-3000-FC3-HF flip chip bonder can dispense solder pastes and epoxies, place solder preforms, and bond various types of devices onto semiconductor

Photograph of the Unaxis Shuttleline inductively coupled plasma etcher.

NanoFab Tool: Unaxis Shuttleline Inductively Coupled Plasma (ICP) Etcher

The Unaxis Shuttleline inductively coupled plasma (ICP) etcher is a general purpose chlorine reactive ion etcher. The high power ICP source combined with low

NanoFab Tool: Unaxis Shuttleline DSEII Deep Silicon Etcher

The Unaxis Shuttleline DSEII deep silicon etcher is an inductively coupled plasma (ICP) etching system used for etching deep features in silicon. The tool uses

Photograph of the Xactix Xetch xenon difluoride silicon etcher.

NanoFab Tool: Xactix Xetch Xenon Difluoride Silicon Etcher

The Xactix Xetch is a single wafer tool which isotropically etches silicon using vapor phase xenon difluoride. The xenon difluoride etch process provides high

NanoFab Tool: Zeiss Gemini 500 Field Emission Scanning Electron Microscope

The Zeiss Gemini 500 Field Emission Scanning Electron Microscope (FE-SEM) is a high resolution FE-SEM which provides nanoscale imaging from 100 mm diameter

NanoFab Tool: Zeiss Gemini 560 Field Emission Scanning Electron Microscope

The Zeiss Gemini 560 Field Emission Scanning Electron Microscope (FE-SEM) is a high resolution FE-SEM which provides nanoscale imaging from 100 mm diameter

Photograph of the Zeiss NVision 40 Cross Beam Microscope.

NanoFab Tool: Zeiss Ultra 60 Field Emission Scanning Electron Microscope

The Zeiss Ultra 60 Field Emission Scanning Electron Microscope (FE-SEM) is a high resolution FE-SEM which provides nanoscale imaging and compositional analysis