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Tools and Instruments

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NanoFab Tool: Reactive Ion Etcher Unaxis 790 Right

The Unaxis 790 reactive ion etcher (RIE) is a general purpose parallel plate plasma etching system which uses ionized fluorocarbon gases and oxygen to etch

NanoFab Tool: Reactive Ion Etcher 790 Nitride Left

This PlasmaTherm 790 reactive ion etcher (RIE) is a parallel plate plasma etching system which uses fluorocarbon and oxygen gases to etch silicon nitride thin

Photograph of the Reynolds RCA wet bench.

NanoFab Tool: Reynolds RCA Wet Bench

The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to processing in high temperature furnaces

Photograph of the Reynolds Tech silicon etch wet bench.

NanoFab Tool: Reynolds Tech Silicon Etch Wet Bench

The Reynolds Tech silicon etch wet bench uses dilute potassium hydroxide (KOH) to preferentially etch silicon along the material's crystal planes. The process

$Rigaku SmartLab X-ray Diffraction System$

NanoFab Tool: Rigaku SmartLab X-Ray Diffraction

The Rigaku SmartLab X-ray diffraction system (XRD) is a fully automated, modular system for advanced x-ray diffraction measurements on a wide range of materials

NanoFab Tool: Sandvik Anneal Furnaces

The two Sandvik anneal furnaces, equipped with silicon carbide tubes, support anneal processing in the NanoFab. The anneal furnaces allow nitrogen, argon and

NanoFab Tool: Sandvik LPCVD LTO

The Sandvik low pressure chemical vapor deposition (LPCVD) of silicon oxide furnace supports low temperature oxide (LTO) on substrates ranging from small chips

NanoFab Tool: Sandvik LPCVD Silicon Nitride

The two Sandvik low pressure chemical vapor deposition (LPCVD) silicon nitride furnaces support stoichiometric and low stress silicon nitride deposition on

NanoFab Tool: Sandvik Oxidation Furnaces

The two Sandvik oxidation furnaces, equipped with silicon carbide tubes, support oxidation processing in the NanoFab. The oxidation furnaces support thermal wet

Photograph of the Semitool PSC-101 double stack spin rinse dryer.

NanoFab Tool: Semitool PSC-101 Spin Rinse Dryer

The Semitool PSC-101 spin rinse dryer uses deionized water to rinse and heated nitrogen to dry whole wafer substrates automatically after wet chemical processes

NanoFab Tool: Sensofar Optical Profilometer

The Sensofar optical profilometer is used to measure height variations including step heights and roughness across a surface using light. It uses a

NanoFab Tool: Silanization Oven

The Silanization Oven is available to users in the Soft Lithography Laboratory. This tool supports the mold adhesion and release processes using organosilanes

NanoFab Tool: SSEC Single Wafer Cleaning System 1

The SSEC model 3300ML single wafer spray acid cleaning system supports general SC1 and Piranha processes in the NanoFab cleanroom. This system mixes, heats and

NanoFab Tool: SSEC Single Wafer Cleaning System 2

The SSEC model 3300ML single wafer spray acid cleaning system supports high purity SC1 and Piranha processes in the NanoFab cleanroom. This system mixes, heats

NanoFab Tool: SSEC Single Wafer Cleaning System 3

The SSEC model 3300ML single wafer spray acid cleaning system supports RCA process in the NanoFab cleanroom. This system mixes, heats and delivers chemicals on

NanoFab Tool: Suss MicroTec SB6 Gen 2 Wafer Bonder

The Suss MicroTec SB6 Gen2 wafer bonder is a substrate bonder that’s equipped to handle a wide range of substrate bonding processes. The bonder accommodates

NanoFab Tool: Thermal Thin-Al Evaporator

The Denton “Bench Top Turbo” thermal evaporator is a single source evaporator equipped with substrate rotation, a thickness monitor, and automatic deposition

Photograph of the Tousimis Autosamdri-815 Series B critical point dryer.

NanoFab Tool: Tousimis Autosamdri-815 Series B

The Tousimis Supercritical Autosamdri-815 Series B critical point dryer utilizes liquid carbon dioxide (LCO 2) to dry substrates in a controlled manner in order

View of the Near Edge X-ray Fine Structure (NEXAFS) experimental station operated by the NIST Synchrotron Science Group at the National Synchrotron Light Source II.

Near Edge X-ray Absorption Fine Structure (NEXAFS)

The Near Edge X-ray Absorption Fine Structure (NEXAFS) experimental stations uses a tunable, focused monochromatic beam of soft X-rays (0.1 keV to 2.2 keV) to

Netzsch STA 449 F1 Jupiter Simultaneous Thermal Analyzer

Netzsch STA 449 F1 Jupiter Simultaneous Thermal Analyzer. Please see manual.

Neutron Imaging Facility (NIF)

Summary The NIST Neutron Imaging Facility provides users with a unique “plug and play” approach to imaging operating fuel cells, electrolyzers, and lithium-ion

Neutron Interferometry and Optics Facilities

The Neutron Interferometry and Optics Facilities (NIOFs) are the World's premier facilities for neutron interferometry and related optical measurements. Neutron

New Brunswick Innova 4200 Incubator-Shaker

Please refer to the owner's manual for further information.

NewAir Al-500S Under Counter Ice Machine

Location: E134

Nexus 670 ThermoNicolet Fourier Transform Infrared Spectrometer

We currently use a high resolution (0.1 cm -1) Nicolet Nexus 670 that is flexible in both its current iteration and is upgradeable for future needs. The optics

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