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PUBLICATIONS

Characterization and Resistive Switching Properties of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates

Published

Author(s)

Joseph L. Tedesco, Walter Zheng, Oleg A. Kirillov, Sujitra J. Pookpanratana, Hyuk-Jae Jang, Premsagar P. Kavuri, Nhan V. Nguyen, Curt A. Richter
Citation
Proceedings of the IEEE
Pub Type
Journals

Keywords

Resistive Switching, Sol-Gel, Thin Films, Flexible Substrates
Nanoelectronics and Nanometrology

Citation

Tedesco, J. , Zheng, W. , Kirillov, O. , Pookpanratana, S. , Jang, H. , Kavuri, P. , Nguyen, N. and Richter, C. (2011), Characterization and Resistive Switching Properties of Solution-Processed HfO2, HfSiO4, and ZrSiO4 Thin Films on Rigid and Flexible Substrates, Proceedings of the IEEE (Accessed November 24, 2024)

Issues

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Created December 7, 2011, Updated February 19, 2017