Ablett, J.
, Woicik, J.
and Tokei, Z.
(2007),
Preliminary Hard X-ray Micro-spectroscopic investigations on Thin-Film Ta-and-W Based Diffusion Barriers for Copper Interconnect Technology, Synchrotron Radiation Instrumentation: Ninth International Conference 879 , , 1, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=854334
(Accessed December 26, 2024)
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Preliminary Hard X-ray Micro-spectroscopic investigations on Thin-Film Ta-and-W Based Diffusion Barriers for Copper Interconnect Technology
Published
Author(s)
J Ablett, , Zs Tokei
Proceedings Title
Synchrotron Radiation Instrumentation: Ninth International Conference 879
Conference Location
, 1
Conference Title
sponsored by PAL/JASRI pages: 1557-1560
Pub Type
Conferences
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If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created September 30, 2007, Updated October 12, 2021