Delahay, F.
, Witt, T.
, Elmquist, R.
and Dziuba, R.
(2000),
Comparison of Quantum Hall Effect Resistance Standards of the NIST and the BIPM, Metrologia, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=7317
(Accessed December 22, 2024)
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Comparison of Quantum Hall Effect Resistance Standards of the NIST and the BIPM
Published
Author(s)
F. Delahay, Thomas J. Witt, , Ronald F. Dziuba
Abstract
An on-site comparison of the quantum Hall effect (QHE) resistance standards of the National Institute of Standards and Technology (NIST) and of the Bureau International des Poids et Mesures (BIPM) was made in April 1999. Measurements of a 100 ω standard in terms of the recommended value of the von Klitzing constant RK-90 agreed to 12 parts in 1010 with a relative combined standard uncertainty uc = 20 x 10-10. Measurements of 10 000 ω and 100 ω/1 ω ratios agreed to 59 parts in 1010 with uc = 55 x 10-10 and 38 parts in 1010 with uc = 35 x 10-10, respectively.Citation
Metrologia
Volume
37
Pub Type
Journals
Download Paper
Keywords
electrical resistance, quantum Hall effect, international comparison
Citation
Issues
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Created December 31, 1999, Updated October 12, 2021