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Silicon etching by kinetic-energy-enhanced chlorine

Published

Author(s)

S R. Leone, F X. Campos, G C. Weaver
Citation
Proc 16th Symposium on Dry Processes Institute of Electrical Engineers of Japan

Citation

Leone, S. , Campos, F. and Weaver, G. (1994), Silicon etching by kinetic-energy-enhanced chlorine, Proc 16th Symposium on Dry Processes Institute of Electrical Engineers of Japan (Accessed December 26, 2024)

Issues

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Created January 1, 1994, Updated February 17, 2017