Mach, C.
, DeWitt, D.
, Tsai, B.
and Yetter, G.
(1994),
Modeling of Solvent Evaporation Effects for Hot Plate Baking of Photoresist, SPIE
(Accessed December 26, 2024)
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Modeling of Solvent Evaporation Effects for Hot Plate Baking of Photoresist
Published
Author(s)
C A. Mach, , , G Yetter
Citation
SPIE
Volume
2195
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 1993, Updated October 12, 2021