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PUBLICATIONS

Towards high accuracy reflectometry for extreme-ultraviolet lithography,

Published

Author(s)

Charles S. Tarrio, Steven E. Grantham, M B. Squires, Robert E. Vest, Thomas B. Lucatorto
Citation
Journal of Research of the National Institute of Standards and Technology
Volume
108
Pub Type
Journals

Citation

Tarrio, C. , Grantham, S. , Squires, M. , Vest, R. and Lucatorto, T. (2003), Towards high accuracy reflectometry for extreme-ultraviolet lithography,, Journal of Research of the National Institute of Standards and Technology (Accessed July 17, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2003, Updated February 17, 2017