Overview of Metrology for the Semiconductor Industry at the National Institute of Standards and Technology

Published

April 4, 2003

Author(s)

Stephen Knight

Abstract

Semiconductor metrology developments at NIST have been conducted since the 1950s, covering a wide range of topics, including investigation of the causes of second breakdown in bipolar transistors, development of the four point probe technique for resistivity measurements, the production of Standard Reference Materials (SRMs) for resistivity, film thickness, and ion implant, to calorimetry for deep ultraviolet (DUV) and extreme ultraviolet (EUV) laser radiation. Currently the total effort of relevance to the semiconductor manufacturing industry and its supporting infrastructure is approximately $31M per year. This overview presentation covers the major programs underway, and highlights the various ways industry can partner with NIST to obtain critically needed metrology techniques, artifacts, calibration services, and results.

Proceedings Title

GOMAC Tech-: Countering Asymmetric Threats

Volume

1

Conference Dates

March 31-April 4, 2003

Conference Location

Tampa, FL

Conference Title

GOMACTech - 03 Volume 1 (previously published as the GOMAC Digest of Technical Papers - Volumes 1 - XXVII (1968-2002)

Pub Type

Conferences

Download Paper

Local Download

Keywords

electronic, metrology, calibration, characterization, collaborate, semiconductor

Citation

Knight, S. (2003), Overview of Metrology for the Semiconductor Industry at the National Institute of Standards and Technology, GOMAC Tech-: Countering Asymmetric Threats, Tampa, FL, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=31263 (Accessed December 21, 2024)