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Steven Grantham (Fed)

Steve Grantham received his Optical Science and Engineering Ph.D. from the University of Central Florida's Center for Research and Education in Optics and Lasers (CREOL). His graduate research involved the study and application of short pulse laser produced plasmas. He has been a beamline scientist at NIST’s SURF III since 1999.  He is currently working on the NIST’s EUV reflectometry, radiometry, and scatterometry projects at SURF III.

Links

Research InterestS

  • EUV reflectometry
  • EUV radiometry
  • Laser-matter interactions
  • Additive manufacturing

Awards

Selected Publications

EUVL dosimetry at NIST

Author(s)
Charles S. Tarrio, Steven E. Grantham, Marc J. Cangemi, Robert E. Vest, Thomas B. Lucatorto, Noreen Harned
As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts

A Novel Wafer-plane Dosimeter for EUV Lithography

Author(s)
Steven E. Grantham, Charles S. Tarrio
Extreme Ultraviolet Lithography (EUVL) incorporates 13.5 nm light for patterning wafers and requires in-situ wafer-plane dosimetry that can be tailored to the

Publications

NIST efforts in extreme-ultraviolet metrology

Author(s)
Charles S. Tarrio, Steven Grantham, Rob Vest, Thomas A. Germer, Bryan Barnes, Stephanie Moffitt, Brian Simonds, Matthew Spidell
For several decades, the National Institute of Standards and Technology (NIST) has actively supported metrology programs for extreme ultraviolet (EUV)
Created October 9, 2019, Updated February 24, 2025