Yang, S.
, Keenan, D.
, Laabs, H.
and Dowell, M.
(2003),
A 193 nm Detector Nonlinearity Measurement System at NIST, Proc., 2003 SPIE Optical Microlithography Conf., Santa Clara, CA, USA
(Accessed March 14, 2025)
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A 193 nm Detector Nonlinearity Measurement System at NIST
Published
Author(s)
, , ,
Abstract
To meet the semiconductor industry's demands for accurate measurements on excimer lasers, we have developed a system using the correlation method to measure the nonlinear response of pulse energy detectors of excimer laser at 193 nm. The response of the detector under test to incident laser pulse energy is compared to the corresponding response of a linear monitor detector. This method solves the difficulties caused by large pulse-to-pulse instability of the excimer laser and delivers measurement results with an expanded uncertainty (k=2) of 0.8 %.Proceedings Title
Proc., 2003 SPIE Optical Microlithography Conf.
Volume
5040
Conference Dates
February 23-28, 2003
Conference Location
Santa Clara, CA, USA
Pub Type
Conferences
Keywords
detector nonlinearity, ultraviolet laser detector calibration, ultraviolet laser metrology
Citation
Issues
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Created December 31, 2002, Updated October 12, 2021