Geist, J.
, Schaefer, A.
, Song, J.
, Wang, Y.
and Zalewski, E.
(1990),
An Accurate Value for the Absorption Coefficient of Silicon at 633 nm, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed July 20, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
An Accurate Value for the Absorption Coefficient of Silicon at 633 nm
Published
Author(s)
, A. R. Schaefer, J-F. Song, Y. H. Wang, E. F. Zalewski
Citation
Journal of Research (NIST JRES) -
NIST Pub Series
Pub Type
NIST Pubs
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created October 29, 1990, Updated October 12, 2021