Tsai, B.
, Lovas, F.
, DeWitt, D.
, Kreider, K.
, Burns, G.
and Allen, D.
(1997),
In-Chamber Thermometry Calibration using a Silicon Proof-Wafer, 5th International Conference of Advanced Thermal Processing of Semiconductors: RTP''97 , New Orleans, LA
(Accessed October 31, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
In-Chamber Thermometry Calibration using a Silicon Proof-Wafer
Published
Author(s)
, , , K G. Kreider, G W. Burns,
Proceedings Title
5th International Conference of Advanced Thermal Processing of Semiconductors: RTP''97
Conference Dates
September 3-5, 1997
Conference Location
New Orleans, LA
Conference Title
Proc. 5th International Conference of Advanced Thermal Processing of Semiconductors: RTP'97
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 1997, Updated February 17, 2017