Characterization of Thin and Ultrathin Polymer and Resist Films

Published

August 1, 2001

Author(s)

D L. Goldfarb, Q Lin, M Angelopoulos, Christopher Soles, Eric K. Lin, Wen-Li Wu

Abstract

The need for a better understanding of the physicochemical properties of radiation-sensitive thin polymer coatings for lithographic applications is driven by the trend of ever-shrinking pattern dimensions and film thickness, imposed by the semiconductor industry. In this work, we address the issue of film uniformity and moisture absorption for thin and ultrathin films (250-50 nm) of poly 4-hydroxystyrene (PHS). Using high resolution x-ray reflectivity, the roughness and density of spin coated films was found to remain constant within experimental error for the thickness range examined. Also, water uptake on PHS films was studied by neutron and x-ray reflectivity. Exposure of the polymer film to a controlled humidity level is shown to swell the polymer and be absorbed uniformly throughout the film. No preferential absorption of water at the interface was noticed, regardless of the hydrophilic or hydrophobic nature of the substrate surface. Overall density changes in the polymer matrix due to the moisture-induced increase in the film thickness are also discussed.

Proceedings Title

Advances in Resist Technology and Processing, Conference | 18th | Advances in Resist Technology and Processing XVIII | SPIE

Volume

4345

Issue

Pt. 1

Conference Dates

February 1, 2001

Conference Location

Undefined

Conference Title

Proceedings of SPIE--the International Society for Optical Engineering

Pub Type

Conferences

Download Paper

Local Download

Keywords

chemically amplified resists, density, moisture absorption, neutron reflectivity, poly-4-hydroxystyrene, roughness, ultrathin films, x-ray reflectivity

Citation

Goldfarb, D. , Lin, Q. , Angelopoulos, M. , Soles, C. , Lin, E. and Wu, W. (2001), Characterization of Thin and Ultrathin Polymer and Resist Films, Advances in Resist Technology and Processing, Conference | 18th | Advances in Resist Technology and Processing XVIII | SPIE, Undefined, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851906 (Accessed July 17, 2024)