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PUBLICATIONS

Confinement Induced Deviation in Ultra-thin Photoresist Films

Published

Author(s)

Christopher L. Soles, Eric K. Lin, Wen-Li Wu, Q Lin, M Angelopoulos
Conference Location
Brookfield, CT
Conference Title
Proceedings of the 12th International Conference on Photopolymers
Pub Type
Conferences

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Local Download

Keywords

Electronic Materials, Lithography, Reflectivity, Thermal Properties, Thin Films, confinement, dynamics, glass transition, lithography, neutron scattering, thermal expansion, thin films

Citation

Soles, C. , Lin, E. , Wu, W. , Lin, Q. and Angelopoulos, M. (2001), Confinement Induced Deviation in Ultra-thin Photoresist Films, Proceedings of the 12th International Conference on Photopolymers, Brookfield, CT, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853792 (Accessed October 31, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2001, Updated February 17, 2017