Christophorou, L.
and Olthoff, J.
(1999),
Electron Interactions with Plasma Processing Gases: An Update for CF<sub>4</sub>, CHF<sub>3</sub>, C<sub>2</sub>F<sub>6</sub> and C<sub>3</sub>F<sub>8</sub>, J. Phys. & Chem. Ref. Data (JPCRD), National Institute of Standards and Technology, Gaithersburg, MD, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=2666
(Accessed January 5, 2025)
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Electron Interactions with Plasma Processing Gases: An Update for CF4, CHF3, C2F6 and C3F8
Published
Author(s)
Loucas G. Christophorou,
Abstract
An update of electron-collision cross sections and electron transport parameters is presented for CF4, CHF3, C2F6, and C3F8.Citation
J. Phys. & Chem. Ref. Data (JPCRD) -
Volume
28
Issue
4
NIST Pub Series
Pub Type
NIST Pubs
Download Paper
Keywords
CF<sub>4</sub>, C<sub>2</sub>F<sub>6</sub>, C<sub>3</sub>F<sub>8</sub>, CHF<sub>3</sub>, cross sections, electron-interactions, scattering, transport coefficients
Citation
Issues
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Created November 30, 1999, Updated October 12, 2021