Skip to main content
U.S. flag

An official website of the United States government

Modeling and Simulation of Resistivity of Nanometer Scale Copper

Published

Author(s)

Emre Yarimbiyik, Harry A. Schafft, Richard A. Allen, Mona E. Zaghloul, David L. Blackburn
Citation
Microelectronics Reliability
Volume
46
Issue
7

Citation

Yarimbiyik, E. , Schafft, H. , Allen, R. , Zaghloul, M. and Blackburn, D. (2006), Modeling and Simulation of Resistivity of Nanometer Scale Copper, Microelectronics Reliability (Accessed March 16, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created June 30, 2006, Updated October 12, 2021