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Displaying 2526 - 2550 of 2609

Rapid Post-Polishing of Diamond-Turned Optics

January 1, 1994
Author(s)
R E. Parks, Christopher J. Evans
A simple technique for post-polishing single-point, diamond-turned optics is described. Synthetic fabric-faced laps are used. Surface finish converges to a limiting value set by process parameters. Lap construction and diamond grit size affects both

Scanning Electron Microscope Metrology

January 1, 1994
Author(s)
Michael T. Postek
During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of precision. Optical microscopy, scanning electron microscopy and the various forms of

Some Considerations for a Measurement Strategy for Circular Features

January 1, 1994
Author(s)
Howard H. Harary, C Buchard, P L heritier, J Dufraigne, P Chollet
The careful study of manufactured parts is a prerequisite for their intelligent inspection. For this study, we conducted a survey of the processes for making holes by manufacturing a set of test parts using ten different machining processes. The holes were

Strategy for Post-Process Control of a Machine Tool

January 1, 1994
Author(s)
Theodore V. Vorburger, K Yee, Brian R. Scace, F Rudder
The automated control of machine-tool accuracy is discussed based on a quality architecture containing three control loops: real-time, process-intermittent, and post-process. This paper highlights the post-process loop. The architecture is being

The Design of an Atomic Force Microscope for Metrology

January 1, 1994
Author(s)
T Mcwaid, J Schneir
Atomic force microscope (AFM) is a rapidly evolving technique which has been used in numerous academic studies since its invention eight years ago. AFM manufacturers are now marketing instruments for industrial metrology applications. The National

The Development of a Calibrated Atomic Force Microscope

January 1, 1994
Author(s)
T Mcwaid, J Schneir
Advances in the manufacture of integrated circuits, x-ray optics, magnetic read-write heads, optical data storage media, razor blades, etc. require advances in ultraprecision metrology. Each of these industries is currently investigating the use of Atomic

The Geometric Characterization of Rockwell Diamond Indenters

January 1, 1994
Author(s)
Jun-Feng Song, F Rudder, Theodore V. Vorburger, A Hartman, Brian R. Scace, J Smith
By using a stylus instrument, a series of calibration and check standards, and calibration and uncertainty calculation procedures, we have calibrated Rockwell diamond indenters with a traceability to fundamental measurements. The combined measurement

The International Standard of Length

January 1, 1994
Author(s)
Dennis A. Swyt
This chapter discusses the modern concept of traceability as it applies to CMM measurements of manufactured parts. It shows the means by which those dimensional measurements are functionally related to the international standard of length, the various

Traceable Standards for Scanning Electron Microscopy

January 1, 1994
Author(s)
Michael T. Postek
The emphasis on International Standards Organization (ISO) certification of laboratories has resulted in a renewed interest in NIST traceable standards for scanning electron microscopy (SEM). Under ISO certification, it is mandatory to calibrate and

Uncertainties in Dimensional Measurements Made at Nonstandard Temperatures

January 1, 1994
Author(s)
Dennis A. Swyt
This report examines the effects of uncertainties in temperature and coefficient of thermal expansion on the expanded uncertainty of length dimensional measurements made away from the international standard reference temperature of 20degrees C for artifact

Variations in Size Measurements by Indicating Gaging Systems

January 1, 1994
Author(s)
Ralph C. Veale, A Strang, S Merrit, H Chou
The National Institute of Standards and Technology has investigated the efficacy of indicating gaging systems used to measure pitch diameter and functional size of threaded fasteners. Three external systems and four internal systems, representing four

Simple, Compact, High-Purity Cr Evaporator for UHV

September 1, 1993
Author(s)
Jabez J. McClelland, John Unguris, R E. Scholten, Daniel T. Pierce
A simple, compact Cr evaporator is constructed by electroplating Cr metal onto the tip of a W hairpin filament. At 5 cm from the evaporator, deposition rates up to 10 nm min -1 (flux {asymp} 10 19 atoms m -2s -1) have been obtained, with total deposition
Displaying 2526 - 2550 of 2609