U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Search Publications

NIST Authors in Bold

Displaying 2026 - 2050 of 2608

NIST-ASME Workshop on Uncertainty in Dimensional Measurements

September 1, 2001
Author(s)
Dennis A. Swyt
A 2 1/2-day workshop on problems in use of uncertainty in dimensional measurements sponsored by NIST and ASME was held June 5-7, 2001, at NIST in Gaithersburg, MD. The workshop was attended by fifty-six representatives of organizations including

NISURF-II, An Upgraded Surface Measuring Facility

September 1, 2001
Author(s)
S Z. Zahwi, M F. Koura, Thomas Brian Renegar, A M. Mekawi
During 1982-1985, a cooperative project was made between the National Bureau of Standards (NBS) at that time (now National Institute of Standards and Technology (NIST - USA)) and the National Institute for Standards (NIS - Egypt) to establish a

Active Monitoring and Control of Electron-Beam-Induced Contaminaition

August 1, 2001
Author(s)
Andras Vladar, Michael T. Postek, R Vane
The vacuum system of all scanning electron microscopes (SEMs), even in the so-called clean instruments, have certain hydrocarbon residues that the vacuum pumps do not effectively remove. The cleanliness of the vacuum and the amount and nature of these

Active Monitoring and Control of Electron-Beam-Induced Contamination

August 1, 2001
Author(s)
Andras Vladar, Michael T. Postek, R Vane
The vacuum systems of all scanning electron microscopes (SEMs), even in the so-called clean instruments, have certain hydrocarbon residues that the vacuum pumps do not effectively remove. The cleanliness of the vacuum and the amount and nature of these

Comparison of Edge Detection Methods Using a Prototype Overlay Calibration Artifact

August 1, 2001
Author(s)
Richard M. Silver, Jay S. Jun, Edward A. Kornegay, R Morton
Accurate overlay measurements rely on robust, repeatable, and accurate feature position determination. In our effort to develop traceable we have examined a number of and the parameters which affect those measurements. The samples used in this study are a

Edge Determination for Polycrystalline Silicon Lines on Gate Oxide

August 1, 2001
Author(s)
John S. Villarrubia, Andras Vladar, J R. Lowney, Michael T. Postek
In a scanning electron microscope (SEM) top-down secondary electron image, areas within a few tens of nanometers of the line edges arc characteristically brighter than the rest of the image. In general, the shape of the secondary electron signal within

Electric Force Microscopy with a Single Carbon Nanotube Tip

August 1, 2001
Author(s)
John A. Dagata, F S. Chien, S Gwo, K Morimoto, T Inoue, J Itoh, H Yokoyama
Carbon nanotube tips offer a significant improvement over standard scanned probe microscope (SPM) tips for electrical characterization of nanodevice structures. Carbon nanotube tips are compatible with requirements for integrated SPM probe station

Problem with Submicrometer-linewidth Standards and A Possible Solution

August 1, 2001
Author(s)
James E. Potzick
Traceable linewidth measurements of tiny features on photomasks and wafers present interesting challenges. Usually technical solutions exist for the problems encountered, but traceability can be costly in time and labor. A measurement is useful only if its

Problem With Submicrometer-Linewidth Standards and a Proposed Solution

August 1, 2001
Author(s)
James E. Potzick
Traceable linewidth measurements of tiny features on photomasks and wafers present interesting challenges. Usually technical solutions exist for the problems encountered, but traceability can be costly in time and labor. A measurement is useful only if its

Reference Material 8091: New Scanning Electron Microscope Sharpness Standard

August 1, 2001
Author(s)
Andras Vladar, Michael T. Postek, Nien F. Zhang, Robert D. Larrabee, Samuel N. Jones, Russell E. Hajdaj
All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and then the instrument is no longer capable of providing as good quality, sharp images as before. This

Reference Material 8091: New Scanning Electron Microscope Sharpness Standard

August 1, 2001
Author(s)
Andras Vladar, Michael T. Postek, Nien F. Zhang, Robert D. Larrabee, Samuel N. Jones, Russell E. Hajdaj
Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small, approximately 2 mm x 2 mm diced semiconductor chip. This sample is capable of being mounted

SEM Sentinel-SEM Performance Measurement System

August 1, 2001
Author(s)
Bradley N. Damazo, Andras Vladar, Alice V. Ling, Alkan Donmez, Michael T. Postek, Crossley E. Jayewardene
This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and

Silicon Single Atom Steps as AFM Height Standards

August 1, 2001
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, V W. Tsai, E. C. Williams, Theodore V. Vorburger, H Edwards, D Cook, P West, R Nyffenegger
Atomic force microscopes (AFMs) are used in the semiconductor industry for a variety of metrology purposes. Step height measurements at the nanometer level and roughness measurements at sub-nanometer levels are often of interest. To perform accurate

PVT Measurements for Toluene in the Near-Critical and Supercritical Regions

July 19, 2001
Author(s)
Asbat E. Bazaev, Ilmutdin Abdulagatov, Joe W. Magee, Emil Bazaev, Michail Rabezkii
The PVT relationships of toluene were measured in the near-critical and supercritical regions. Measurements were made using a constant-volume peizometer immersed in a precision thermostat. The volume of the piezometer V PT was corrected for both

FEA Modeling and Hardness Performance Prediction of Rockwell Diamond Indenters

July 1, 2001
Author(s)
Hui Zhou, Jun-Feng Song, Samuel Low, Li Ma
The difficulty in manufacturing Rockwell diamond indenters to the required geometric specifications has resulted in most commercially manufactured indenters to vary in shape from one indenter to another. This difference in shape is thought to be a major

Mass Flow Research and Standards: NIST Workshop Results

July 1, 2001
Author(s)
Robert F. Berg, David S. Green, G E. Mattingly
A recent workshop at the National Institute of Standards and Technology (NIST) identified research and standards that will benefit users and manufacturers of mass flow controllers and related equipment. The workshop identified problems with flow

Single-Integral-Equation Method for Scattering by Dielectric Cylinders

July 1, 2001
Author(s)
Egon Marx
Electromagnetic scattering of an incident plane monochromatic wave by dielectric or finitely conducting infinite cylinders of arbitrary shape, possibly in the presence of a substrate, can be reduced to the solution of scalar Helmholtz equations in two

Single-Integral-Equation Method for Three-Dimensional Scattering

July 1, 2001
Author(s)
Egon Marx
The fields scattered by a homogeneous dielectric or finitely conducting object can be obtained from two tangential vector fields, the components of the electric and magnetic fields, on the interface. We have adapted the single-integral-equation method for

Critical Dimension Metrology in the Scanning Electron Microscope

June 29, 2001
Author(s)
Michael T. Postek, Andras Vladar
Metrology is a principal enabler for the development and manufacture of current and future generations of semiconductor devices. With the potential of 130, 100 nanometer and even smaller linewidths and high aspect ratio structures, the scanning electron

Analysis of Dimensional Metrology Standards

June 1, 2001
Author(s)
Thomas R. Kramer, John Evans, Simon P. Frechette, John A. Horst, Hui-Min Huang, Elena R. Messina, Frederick M. Proctor, William G. Rippey, Harry A. Scott, Theodore V. Vorburger, Albert J. Wavering
This is an analysis of standards related to dimensional metrology, with recommendations regarding standards development. The analysis focuses on the degree to which existing and developing standards provide a complete set of non-overlapping specifications
Displaying 2026 - 2050 of 2608