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NIST Authors in Bold

Displaying 2076 - 2100 of 2608

Establishment of a Virtual/Physical Standard for Bullet Signature Measurements

January 1, 2001
Author(s)
Jun-Feng Song, Theodore V. Vorburger, M Ols
The National Integrated Ballistics Information Network (NIBIN) is currently under development by the Bureau of Alcohol, Tobacco and Firearms (ATF) and the Federal Bureau of Investigation (FBI). The National Institute of Standards and TEchnology (NIST) and

Establishment of Measurement Traceability for NIST Standard Bullets and Casings

January 1, 2001
Author(s)
Jun-Feng Song, Theodore V. Vorburger, M Ols
The National Integrated Ballistics Information Network (NIBIN) is currently under development by the Bureau of Alcohol, Tobacco and Firearms (ATF) and the Federal Bureau of Investigation (FBI). The NIST Standard Bullets and Casings Project aims to provide

Future Voltage Metrology at NIST

January 1, 2001
Author(s)
Yi-hua D. Tang, June E. Sims, Michael H. Kelley
Presently NIST uses a voltage calibration path to maintain the U.S. legal volt and provide for the dissemination of an internationally consistent, accurate, reproducible and traceable voltage standard, tied to the SI units. Potential improvements and

Kinematic Modeling and Analysis of a Planar Micro-Positioner

January 1, 2001
Author(s)
Nicholas G. Dagalakis, John A. Kramar, E Amatucci, Robert Bunch
The static and dynamic performance of a control system depends on the accuracy of the mathematical model of the plant that is being controlled. In this work, the accuracies of a linear and a second-order kinematic model were evaluated for a two-dimensional

Length and Dimensional Measurement at NIST

January 1, 2001
Author(s)
Dennis A. Swyt
This paper reports on the past, present, and future of length and dimensional measurements at NIST. It covers the evolution of the SI unit of length through its three definitions and the evolution of NBS-NIST dimensional measurement from early linescales

Modeling, Simulation and Prediction of Rockwell Hardness Indentation

January 1, 2001
Author(s)
Li Ma, J Zhou, Theodore V. Vorburger, R Dewit, Richard J. Fields, Samuel Low, Jun-Feng Song
Rockwell hardness test, as a measure of the resistance of a material to localized plastic deformation, is a valuable and widely used mechanical test. However, the accuracy of Rockwell hardness measurement is still in question. The indenter, including both

Molecular Measuring Machine Design and Performance

January 1, 2001
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Vincent P. Scheuerman, Fredric Scire, E C. Teague
We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microscope

Neolithography Consortium: A Progress Report

January 1, 2001
Author(s)
James E. Potzick
The role of process simulation is becoming an increasingly important part of microlithography process control and photomask metrology as wafer feature sizes become smaller than the exposure wavelength, because the pattern transfer from photomask to wafer

NIST Centenial Sessions August Second Two Thousand and One

January 1, 2001
Author(s)
W Anderson, Dennis A. Swyt, H Semerjian
The National Conference of Standards Laboratories International was formed in forty years ago (as NCSL) to promote cooperative efforts for solving the common problems faced by measurement laboratories. The principal driver for its establishment was the

NIST/SEMATECH Collaboration: Application of Nano-Tips to Production CD-SEMs

January 1, 2001
Author(s)
Andras Vladar, Michael T. Postek
This is the final report of a two-part study about the application of nano-tips to critical dimension (CD) scanning electron microscope (SEMs) used in integrated circuit production. Nano-tips are essentially very sharp electron emitter tips that offer an

Overlay Metrology: Recent Advances and Future Solutions

January 1, 2001
Author(s)
Richard M. Silver, Jay S. Jun, S Fox, Edward A. Kornegay
As devices shrink and clock speeds continue to increase, process control and measurement of I critical dimension linewidths and the essential overlay of features from different photolithographic levels become increasingly important. Improved manufacturing

Sapphire Statistical Characterization and Risk Reduction Program

January 1, 2001
Author(s)
Donald McClure, Robert Cayse, David R. Black, Steven Goodrich, K Lagerloef, D Peter, Daniel C. Harris, Dale McCullum, Daniel H. Platus, Charles E. Patty, Robert S. Polvani
The Sapphire Statistical Characterization and Risk Reduction Program tested 1400 4-point flexure bars with different crystal orientations at different temperatures to establish a mechanical strength database for engineering design. Sapphire coupons were

SEM Sentinel - SEM Performance Measurement System

January 1, 2001
Author(s)
Bradley N. Damazo, Andras Vladar, Alice V. Ling, M A. Donmez, Michael T. Postek, Crossley E. Jayewardene
This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and

SI Traceability of Force at the Nanonewton Level

January 1, 2001
Author(s)
David B. Newell, Jon R. Pratt, John A. Kramar, Douglas T. Smith, L Feeney, Edwin R. Williams
Although nanonewton force measurements are commonplace in industry, no National Measurement Institute supports a link to the International System of Units (SI) below one newton. The National Institute of Standards and Technology has launched a five-year

Strengths and Limitations of Surface Texture Characterization Techniques

January 1, 2001
Author(s)
Theodore V. Vorburger
Surface finish is important to the function of a wide range of industrial components including highways, ship hulls and propellers, mechanical parts, semiconductors, and optics. Hence, many documentary standards have been developed for specifying surface

Ultrastable Laser Array at 633 nm for Real-Time Dimensional Metrology

January 1, 2001
Author(s)
Y Lecoq, J Pedulla, John Lawall
We describe a laser system for very high-accuracy dimensional metrology. A sealed-cavity helium-neon laser is offset-locked to an iodine-stabilized laser in order to realize a secondary standard with higher power and less phase noise. Synchronous averaging

1,6-Hexanedithiol Monolayers on Au(111): A Multi-Technique Structural Study

December 29, 2000
Author(s)
T Leung, M Gerstenberg, D J. Lavrich, G Scoles, F Schreiber, G Poirier
Monolayers of 1,6-hexanedithiol [HS(CH 2) 6SH] deposited on Au(111) from the gas phase were characterized by scanning tunneling microscopy (STM), grazing incidence X-ray diffraction (GIXD), and low energy atom diffraction (LEAD). Molecular resolution STM
Displaying 2076 - 2100 of 2608