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Displaying 2226 - 2250 of 2608

Physics Laboratory Technical Activities 1998

January 1, 1999
Author(s)
K B. Gebbie
This report summarizes research projects measurement method developments, calibration and testing services, and data evaluation activities that were carried out during calendar year 1998 in the NIST Physics Laboratory. These activities are in the areas of

Radiationless Resonant Raman Scattering at the Ar K Edge

January 1, 1999
Author(s)
Thomas W. LeBrun, S H. Southworth, G B. Armen, M A. MacDonald, Y Azuma
Partial cross sections for Ar K-LZL3(1 D2)np, n=4 and 5 spectator Auger states excited by x-ray absorption across the K-edge were measured and compared with calculations based on the theory or radiationless resonant Raman scattering. Core relaxation and

Sources of Error in Absolute Distance Interferometry

January 1, 1999
Author(s)
Jack A. Stone Jr., Alois Stejskal, Lowell P. Howard
In this paper we describe the status of our research on the use of diode lasers for absolute distance interferometry, and we discuss the major sources of uncertainty that limit the accuracy of this technique for distance measurement. We have primarily

Telepresence: A New Paradigm for Solving Contamination Problems

January 1, 1999
Author(s)
Michael T. Postek, Marylyn H. Bennett, N J. Zaluzec
When a contamination event occurs in a semiconductor fab, a process engineer must act quickly to find the cause. It is cost-prohibitive to maintain a full complement of analytical tools in a fab that would be necessary to identify very small particles and

Telepresence: A New Paradigm for Solving Contamination Problems

January 1, 1999
Author(s)
Michael T. Postek, Marylyn H. Bennett, N J. Zaluzec
When a contamination event occurs in a semiconductor fab, a process engineer must act quickly to find the cause. It is cost-prohibitive to maintain a full compliment of analytical tools in a fab that would be necessary to identify very small particles and

Tip Characterization for Dimensional Nanometrology

January 1, 1999
Author(s)
John S. Villarrubia
Technological trends are increasingly requiring dimensional metrology at size scales below a micrometer. Scanning probe microscopy has unique advantages in this size regime, but width and roughness measurements must be corrected for imaging artifacts. This

Accuracy Differences Among Photomask Metrology Tools and Why They Matter

December 1, 1998
Author(s)
James E. Potzick
A variety of different kinds of photomask critical dimensions (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have different cost, throughput

Calculation of Measurement Uncertainty Using Prior Information

November 1, 1998
Author(s)
Steven D. Phillips, William T. Estler
We describe the use of Bayesian inference to include prior information about the value of the measurand in the calculation of measurement uncertainty. Typical examples show this can, in effect, reduce the expanded uncertainty by up to 85 %. The application

NIST Microform Calibration - How Does It Benefit U.S. Industry?

October 1, 1998
Author(s)
Jun-Feng Song, Theodore V. Vorburger
In microform metrology, complex 3-D surface features in the micrometer range must be quantified for their space and size including dimensions, curves, angles, profile deviations, and alignment errors, as well as surface roughness with measurement

NIST Virtual/Physical Random Profile Roughness Calibration Standards

October 1, 1998
Author(s)
Jun-Feng Song, Christopher J. Evans, Michael L. McGlauflin, Eric P. Whitenton, Theodore V. Vorburger, Y B. Yuan
The NIST (National Institute of Standards and Technology) virtual/physical surface roughness calibration standard consists of physical specimens whose surfaces are manufactured by a numerically controlled diamond-turning process using digitized profiles

Accuracy Differences Among Photomask Metrology Tools--and Why They Matter

September 1, 1998
Author(s)
James E. Potzick
A variety of different kinds of photomask critical dimension (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have differing cost, throughput

Case Against Optical Gauge Block Metrology

September 1, 1998
Author(s)
Theodore D. Doiron, Dennis S. Everett, Bryon S. Faust, Eric S. Stanfield, John R. Stoup
The current definition of length of a gage block is a very clever attempt to evade the systematic errors associated with the wringing layer thickness and optical phase corrections. In practice, there are very large systematic operator and surface effects

Minimizing Error Sources in Gage Block Mechanical Comparison Measurements

September 1, 1998
Author(s)
Bryon S. Faust, John R. Stoup, Debra K. Stanfield
Error sources in gage block mechanical comparisons can range from classical textbook examples (thermal gradients, correct temperature value, and correct master value) to a completely counter-intuitive example of diamond probe tip wear at low applied force

A System to Measure Current Transducer Performance

July 1, 1998
Author(s)
Bryan C. Waltrip, Thomas L. Nelson
A special purpose ac current transducer measurement system capable of intercomparing transducers with ac output voltage ratios from 1:1 to 50:1 has been developed to extend the range and accuracy of current transformer, current shunt, and mutual inductor

Capacitance and Dissipation Factor Measurements from 1 kHz to 10 MHz

July 1, 1998
Author(s)
Andrew D. Koffman, Bryan C. Waltrip, Nile M. Oldham, S. Avramov
A measurement technique developed by K. Yokoi et al. At Hewlett-Packard Japan, Ltd. Has been duplicated and evaluated at NIST to characterize four-terminal pair capacitors. The technique is based on an accurate three-terminal measurement made at 1 kHz
Displaying 2226 - 2250 of 2608