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NIST Authors in Bold

Displaying 2351 - 2375 of 2609

Hybrid Optical-Electrical Overlay Test Structure

January 1, 1997
Author(s)
Michael W. Cresswell, Robert Allen, L Linholm, William F. Guthrie, William B. Penzes, A Gurnell
This paper describes the exploratory use of electrical test structures to enable the calibration of optical overlay instruments of the type used to monitor semiconductor-device fabrication processes. Such optical instruments are known to be vulnerable to

Industrial Uses of STM and AFM

January 1, 1997
Author(s)
Theodore V. Vorburger, John A. Dagata, G. Wilkening, K Iizuka
We review the field of STM and AFM as applied to industrial problems, and we classify the applications into four classes: research with potential benefit to industry, research performed by industry, applications off-line in manufacturing, and applications

Integral Equations for Scattering by a Particle in a Layer

January 1, 1997
Author(s)
Egon Marx
The single integral equation method is applied to the scattering of electromagnetic waves by particles in a layer on top of a substrate. A second layer on top of the first one can have indentations.

Measurement Comparison of Stylus Radii

January 1, 1997
Author(s)
Jun-Feng Song, Theodore V. Vorburger
Three methods were used for measuring the radii of the same stylus of our stylus instrument. The measurement results were compared and showed good agreement. Using razor blade tracing, the stylus radius was measured as r=1.60um with an expanded uncertainty

New NIST-Certified Small Scale Pitch Standard

January 1, 1997
Author(s)
James E. Potzick
The National Institute of Standards and Technology is developing a dimensional pitch standard covering the range 1 ?m to 10 mm, intended for the calibration of microscope magnification and dimensional metrology instrument scales. While NIST has long

On Chip Morphology, Tool Wear and Cutting Mechanics in Finish Hard Turning

January 1, 1997
Author(s)
Matthew A. Davies, Y K. Chou, Christopher J. Evans
Topography of surfaces produced in finish hard turning using cubic boron nitride (CBN) tools is affected by a large number of factors including tool wear and the mechanics of the chip formation process. This paper shows first that tool wear rates are

On the Dynamics of Chip Formation in Machining Hard Metals

January 1, 1997
Author(s)
Matthew A. Davies, Timothy J. Burns, Christopher J. Evans
The results of orthogonal cutting tests on electroplated Nickel-Phosphorus (15% phosphorus) and AISI 52100 bearing steel are presented and compared. For both materials, chips become segmented at relatively low cutting speeds (0.3 m/s to 2 m/s) due to the

Optically Isolated Current to Voltage Converter in an Electron Optics System

January 1, 1997
Author(s)
Alan H. Band, John Unguris
A simple, inexpensive, optically isolated current-to-voltage converter circuit has been developed for the measurement of bipolar currents in the range of 10 pA to 1 %A on the biased elements of an electron optics system at voltages up to 3.5 kV. The design

Pitch and Step Height Measurements Using NIST

January 1, 1997
Author(s)
R Koning, Ronald G. Dixson, Joseph Fu, V W. Tsai, Theodore V. Vorburger, Edwin R. Williams, X Wang
The use of the atomic force microscope (AFM) for step height and pitch measurements in industrial applications is rapidly increasing. To compare the results obtained by different instruments and to achieve high accuracy, the scales of an AFM must be

Results of the NIST National Ball Plate Round Robin

January 1, 1997
Author(s)
Gregory W. Caskey, Steven D. Phillips, Bruce R. Borchardt
This report examines the results of the ball plate round robin administered by NIST. The round robin was part of an effort to assess the current state of industry practices for measurements made using coordinate measuring machines. Measurements of a two

The Calculation of CMM Measurement Uncertainty via The Method of Simulation by Constraints

January 1, 1997
Author(s)
Steven D. Phillips, Bruce R. Borchardt, Daniel S. Sawyer, William T. Estler, David E. Ward, K Eberhardt, M. Levenson, Marjorie A. McClain, B Melvin, Ted Hopp, Y Shen
The calculation of task specific measurement uncertainty when using coordinate measuring machines is an important and challenging task. Current methods to address this issue use simulation techniques (e.g., the virtual CMM) where the propagation of known

The Scanning Electron Microscope

January 1, 1997
Author(s)
Michael T. Postek
The scanning electron microscope (SEM) is an important research and production tool extensively used in many phases of industry throughout the world. The popularity of the instrument results from the need to inspect and obtain information about samples

Tip and Surface Reconstruction in Scanned Probe Microscopy

January 1, 1997
Author(s)
John S. Villarrubia
The non-vanishing size of tips in scanned probe microscopes (e.g., atomic force microscope or scanning tunneling microscope) results in imaging errors. Correction of these errors requires estimation of the tip shape (tip reconstruction) followed by

Is Your Scanning Electron Microscope Hi-Fi?

December 7, 1996
Author(s)
Andras Vladar, Michael T. Postek, S Davilla
The scanning electron microscope (SEM) historically has been used mainly as an image-producing device and, in spite of certain obvious and sometimes serious electronics problems, serves in this function as an acceptable and effective instrument for many

Error Compensation for CMM Touch Trigger Probes

October 1, 1996
Author(s)
William T. Estler, Steven D. Phillips, Bruce R. Borchardt, Ted Hopp, G Witzgall, M Levenson, K Eberhardt, Marjorie A. McClain, Y Shen, X Zhang
We present the analysis of a simple mechanical model of a common type of kinematic seat touch trigger probe widely used on modern coordinate measuring machines (CMMs). The model provides a quantitative description of the pretravel variation or probe-lobing

Stylus-Laser Surface Calibration System

October 1, 1996
Author(s)
Theodore V. Vorburger, Jun-Feng Song, T Giauque, Thomas Brian Renegar, Eric P. Whitenton, M Croarkin
A stylus-laser surface calibration system was developed to calibrate the NIST sinusoidal roughness Standard Reference Materials (SRM) 2071-2075. Step height standards are used to calibrate the stylus instrument in the vertical direction, and a laser
Displaying 2351 - 2375 of 2609