U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Search Publications by: Wen-Li Wu (Assoc)

Search Title, Abstract, Conference, Citation, Keyword or Author
Displaying 126 - 150 of 193

Chain Conformation in Ultrathin Polymer Films

December 1, 2002
Author(s)
Ronald L. Jones, Christopher Soles, Francis W. Starr, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, D L. Goldfarb, M Angelopolous
Using Small Angle Neutron Scattering (SANS), we present the first quantitative measurements of the 3-dimensional conformation of macromolecules in thin polymer films of D RG,Bulk. Where D is the film thickness and RG,Bulk is the bulk radius of gyration

Measurement of the Spatial Evolution of the Deprotection Reaction Front With Nanometer Resolution Using Neutron Reflectometry

December 1, 2002
Author(s)
Eric K. Lin, Sushil K. Satija, Wen-Li Wu, Christopher L. Soles, D L. Goldfarb, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Willson
The use of chemically amplified photoresists for the fabrication of sub-100 nm features will require spatial control with nanometer level resolution. To reach this goal, a detailed understanding of the complex reaction-diffusion mechanisms at these length

Pore Size Distributions in Low-K Dielectric Thin Films From X-Ray Porosimetry

October 1, 2002
Author(s)
Hae-Jeong Lee, Christopher L. Soles, Da-Wei Liu, Barry J. Bauer, Wen-Li Wu
X-ray reflectivity has been used to determine the mass uptake of probe molecules in porous thin films supported on thick silicon wafers. The adsorption occurs by capillary condensation when the films are exposed to probe vapor at controlled partial vapor

Reaction Front Induced Roughness in Chemically Amplified Photoresists

August 1, 2002
Author(s)
Vivek Prabhu, Ronald L. Jones, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Christopher Soles, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
We have examined, with tapping mode atomic force microscopy(AFM), the effect of post-exposure bake times and developer on surface roughness using model bilayer interfaces of deuterium-labeled poly(tert-butyloxycarbonyloxy styrene) and poly(hydroxystyrene)

Direct Measurement of the Reaction Front in Chemically Amplified Photoresists

July 1, 2002
Author(s)
Eric K. Lin, Sushil K. Satija, Wen-Li Wu, Christopher L. Soles, D L. Goldfarb, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Willson
The continuing drive by the semiconductor industry to fabricate smaller structures with photolithography will soon require dimensional control at length scales, (2 to 5) nm, comparable to the size of the polymeric molecules in the materials used to pattern

Deviations in the Thermal Properties of Ultrathin Polymer Network Films

June 1, 2002
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu
X-ray reflectivity was used to characterize the electron density and rubbery expansion for cross-linked epoxy network films of various thickness adhered to silicon wafers. Reflectivity profiles from all the films were best fit by single layer model. In

Probing Surface and Bulk Chemistry in Resist Films Using Near Edge X-Ray Absorption Fine Structure

May 1, 2002
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Eric K. Lin, Christopher Soles, Wen-Li Wu, Daniel A. Fischer, S Sambasivan, D L. Goldfarb, M Angelopoulos
Control of the shape, critical dimension (CD), and roughness is critical for the fabrication of sub 100 nm features, where the CD and roughness budget are approaching the molecular dimension of the resist polymers. One focus of our research is identifying

Controlling Morphology During Pattern Development in Thin Film Photoresists

February 1, 2002
Author(s)
Ronald L. Jones, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Christopher L. Soles, Wen-Li Wu
We report on attempts to control surface morphology using current lithographic processes critical to the development of both inorganic and organic nano-structures. Bilayers of protected (base insoluble) and deprotected (base soluble) model lithographic

A Combinatorial Methodology to Discovering the Material Factors Controlling Resist Line Edge Roughness, Shape, and Critical Dimension

January 28, 2002
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Eric K. Lin, Christopher Soles, Wen-Li Wu, D M. Goldfarb, M Angelopoulos
A combinatorial research methodology is discussed to determine the material factors that control line edge roughness (LER), shape, and critical dimension (CD) of developed photo-resist features. The approach involves generating a gradient of processing

A Broad Perspective on the Dynamics of Highly Confined Polymer Films

January 1, 2002
Author(s)
Christopher L. Soles, Jack F. Douglas, Wen-Li Wu, H Peng, D W. Gidley
The manner in which the dynamics of a polymer are affected by thin film confinement is of technological significance, impacting thin film applications such as lubricants, adhesives, and chemically amplified photoresists. In this manuscript we use specular