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Search Publications by: Wen-Li Wu (Assoc)

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Displaying 151 - 175 of 193

Incoherent Neutron Scattering and the Dynamics of Confined Polycarbonate Films

January 1, 2002
Author(s)
Christopher L. Soles, Jack F. Douglas, Wen-Li Wu, Robert M. Dimeo
Incoherent elastic neutron scattering measurements are performed on thin (1015 to 75 ) polycarbonate films supported on Si wafers. The mean-square atomic displacement is determined by fitting the intensity data to the Debye-Waller factor and we find that

Structural Characterization of Porous Low-k SiOC Thin Films Using Novel X-Ray Porosimetry

January 1, 2002
Author(s)
H W. Kim, Wen-Li Wu, Barry J. Bauer, Eric K. Lin, J Y. Kim, Y H. Kim, V. J. Lee
A novel x-ray porosimetry measurement is used to characterize the structure and properties of porous low-k dielectric films after varying process conditions. We determine the film thickness, density depth profile, average density, wall density, and

Confinement Effects on the Spatial Extent of the Reaction Front in Ultrathin Chemically Amplified Photoresists

December 1, 2001
Author(s)
D L. Goldfarb, M Angelopoulos, Eric K. Lin, Ronald L. Jones, Christopher Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu
Sub-100 nm lithography poses strict requirements on photoresist material properties and processing conditions to achieve necessary critical dimension (CD) control of patterned structures. As resist thickness and feature linewidth decrease, fundamental

Thin Film Confinement Effects on the Thermal Properties of Model Photoresist Polymers

December 1, 2001
Author(s)
Christopher L. Soles, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
The demand to print increasingly smaller microelectronic device features means that the thickness of the polymer films used in the lithographic processes must decrease. The thickness of these films is rapidly approaching the unperturbed dimensions of the

Probe Diffusion in Thin PS Free-Standing Films

November 1, 2001
Author(s)
Y Pu, H White, Miriam Rafailovich, J Sokolov, A Patel, Christopher C. White, Wen-Li Wu, V Zaitsev, S A. Schwarz
DSIMS was performed to determine the dynamics of thin free standing polystyrene films by investigating the probe diffusion in high molecular weight polymer matrix. It is found that the temperature dependence of the diffusion of small molecular probes can

X-Ray Reflectivity and FTIR Measurements of N2 Plasma Effects on the Density Profile of Hydrogen Silsesquioxane Thin Films

October 1, 2001
Author(s)
V. J. Lee, C G. Chao, Eric K. Lin, Wen-Li Wu, B M. Fanconi, J K. Lan, Y L. Cheng, H C. Liou, Y L. Wang, M S. Feng
Non-destructive, specular X-ray reflectivity (SXR) measurements were used to investigate N2 plasma effects on the density depth profile of hydrogen silsesquioxane (HSQ) thin films. The SXR data indicate that the density profile of an HSQ film without

Measuring T g in Ultra-Thin Polymer Films With an Excimer Fluorescence Technique

September 1, 2001
Author(s)
Christopher C. White, Kalman D. Migler, Wen-Li Wu
An excimer fluorescence technique has been applied to the measurement of T g of ultra-thin polystyrene films. This technique utilizes an excimer-forming molecule with fluorescent emission in two wavelength bands. The intensity ratio of these bands is a

Characterization of Thin and Ultrathin Polymer and Resist Films

August 1, 2001
Author(s)
D L. Goldfarb, Q Lin, M Angelopoulos, Christopher Soles, Eric K. Lin, Wen-Li Wu
The need for a better understanding of the physicochemical properties of radiation-sensitive thin polymer coatings for lithographic applications is driven by the trend of ever-shrinking pattern dimensions and film thickness, imposed by the semiconductor

Polymer Chain Relaxation: Surface Outpaces Bulk

July 1, 2001
Author(s)
William E. Wallace, Daniel A. Fischer, K Efimenko, Wen-Li Wu, Jan Genzer
In this work we show how carbon near-edge X-ray absorption fine structure (NEXAFS) can be applied to detect both surface and bulk segmental relaxation in uniaxially deformed polystyrene samples. We demonstrate that by simultaneously monitoring the partial

Structure and Property Characterization of Low-k Dielectric Porous Thin Films

April 1, 2001
Author(s)
Barry J. Bauer, Eric K. Lin, V. J. Lee, Haonan Wang, Wen-Li Wu
High-resolution X-ray reflectivity and small angle neutron scattering measurements are used as complementary techniques to characterize the structure and properties of porous thin films for use as low-k interlevel dielectric (ILD) materials. With the

Abstracts for the MSEL Assessment Panel, March 2001

January 26, 2001
Author(s)
Leslie E. Smith, Alamgir Karim, Leonid A. Bendersky, C Lu, J J. Scott, Ichiro Takeuchi, Kathleen M. Flynn, Vinod K. Tewary, Davor Balzar, G A. Alers, Stephen E. Russek, Charles C. Han, Haonan Wang, William E. Wallace, Daniel A. Fischer, K Efimenko, Wen-Li Wu, Jan Genzer, Joseph C. Woicik, Thomas H. Gnaeupel-Herold, Henry J. Prask, Charles F. Majkrzak, Norman F. Berk, John G. Barker, Charles J. Glinka, Eric K. Lin, Ward L. Johnson, Paul R. Heyliger, David T. Read, R R. Keller, J Blendell, Grady S. White, Lin-Sien H. Lum, Eric J. Cockayne, Igor Levin, C E. Johnson, Maureen E. Williams, Gery R. Stafford, William J. Boettinger, Kil-Won Moon, Daniel Josell, Daniel Wheeler, Thomas P. Moffat, W H. Huber, Lee J. Richter, Clayton S. Yang, Robert D. Shull, R A. Fry, Robert D. McMichael, William F. Egelhoff Jr., Ursula R. Kattner, James A. Warren, Jonathan E. Guyer, Steven P. Mates, Stephen D. Ridder, Frank S. Biancaniello, D Basak, Jon C. Geist, Kalman D. Migler
Abstracts relating to research and development in the NIST Materials Science and Engineering Laboratory (MSEL) are presented for a poster session to be presented to the 2001 MSEL Assessment Panel.

Small-Angle Neutron Scattering Measurements of Nanoscale Lithographic Features

December 1, 2000
Author(s)
Wen-Li Wu, Eric K. Lin, Q Lin, M Angelopoulos
The continuing decrease in feature sizes in the semiconductor and other nanofabriation industries has placed increasingly stringent demands on current microscopy-based techniques to precisely measure both the critical dimensions and the quality (i.e. line