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Search Publications by: David W. Allen (Fed)

Displaying 76 - 84 of 84

Radiometric Calibration of the Scripps Earth Polychromatic Imaging Camera, ed. by W.L. Barnes

January 1, 2001

Author(s)

E A. Early, B C. Bush, Steven W. Brown, David W. Allen, Bettye C. Johnson

Chamber Radiation Effects on Calibration of Radiation Thermometers With a Thin-Film Thermocouple Test Wafer

June 1, 1999

Author(s)

Benjamin K. Tsai, D P. DeWitt, Francis J. Lovas, Kenneth G. Kreider, Christopher W. Meyer, David W. Allen

In the semiconductor industry, Rapid Thermal Processing (RTP) utilizes a prescribed temperature-time recipe to silicon wafers undergoing processes such as annealing and oxide film formation. The National Technology Roadmap for Semiconductors (NTRS)

Chamber Radiation Effects on Calibration of Radiation Thermometers with a Thin-Film Thermocouple Test Wafer, ed. by J.F. Dubbeldam and M.J. de Groot

January 1, 1999

Author(s)

Benjamin K. Tsai, D P. DeWitt, Francis J. Lovas, K G. Kreider, C W. Meyer, David W. Allen

ITS-90 Calibration of Radiometers Using Wire/Thin-Film Thermocouples in the NIST RTP Tool: Experimental Procedures and Results

January 1, 1999

Author(s)

C W. Meyers, David W. Allen, D P. DeWitt, K G. Kreider, Francis J. Lovas, Benjamin K. Tsai

Heat Transfer in Turbulent Supercritical Carbon Dioxide Flowing in a Heated Horizontal Tube

September 1, 1998

Author(s)

Douglas A. Olson, David W. Allen

We report measurements of heat transfer coefficients of flowing supercritical carbon dioxide (7.38 MPa critical pressure, 31.1 degrees C critical temperature) in a heated horizontal tube. The tube was 10.9 mm ID, was heated over 274 cm, and had an unheated

RTP Calibration Wafer Using Thin-Film Thermocouples

April 1, 1998

Author(s)

Kenneth G. Kreider, D P. DeWitt, Benjamin K. Tsai, Francis J. Lovas, David W. Allen

Rapid thermal processing (RTP) is a key technology for the cluster tool, single wafer manufacturing approach that is used to produce integrated circuits at lower cost with reduced line widths and thermal budgets. However, various problems associated with

Calibration Wafer for Temperature Measurement in RTP Tools

January 1, 1998

Author(s)

K G. Kreider, D P. DeWitt, Benjamin K. Tsai, Francis J. Lovas, David W. Allen

RTP Calibration Wafer Using Thin-Film Thermocouples, ed. by M.C. Ozturk, F. Roozeboom, P.J. Timans, and S.H. Pas

January 1, 1998

Author(s)

K G. Kreider, D P. DeWitt, Benjamin K. Tsai, Francis J. Lovas, David W. Allen

In-Chamber Thermometry Calibration using a Silicon Proof-Wafer

January 1, 1997

Author(s)

Benjamin K. Tsai, Francis J. Lovas, D P. DeWitt, K G. Kreider, G W. Burns, David W. Allen