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Semiconductor Measurement Technology: The Results of an Interlaboratory Study of Ellipsometric Measurements of Thin Film Silicon Dioxide on Silicon

Published

Author(s)

Barbara J. Belzer, David L. Blackburn
Citation
Special Publication (NIST SP) -

Citation

Belzer, B. and Blackburn, D. (1997), Semiconductor Measurement Technology: The Results of an Interlaboratory Study of Ellipsometric Measurements of Thin Film Silicon Dioxide on Silicon, Special Publication (NIST SP), National Institute of Standards and Technology, Gaithersburg, MD (Accessed December 30, 2024)

Issues

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Created April 30, 1997, Updated October 12, 2021