Postek, M.
, Lowney, J.
, Vladar, A.
, Keery, W.
, Marx, E.
and Larrabee, R.
(1993),
X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement, Journal of Research (NIST JRES), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed December 26, 2024)
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X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement
Published
Author(s)
, , , , E Marx,
Citation
Journal of Research (NIST JRES) -
NIST Pub Series
Pub Type
NIST Pubs
Citation
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If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created July 31, 1993, Updated October 12, 2021