Wilson, R.
and Jamba, D.
(1982),
Differential capacitance-voltage profiling of Schottky barrier diodes for measuring implanted depth distributions in silicon:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NBS.SP.400-71
(Accessed November 8, 2024)
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Differential capacitance-voltage profiling of Schottky barrier diodes for measuring implanted depth distributions in silicon:
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- NBS SP 400-71
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NBS SP 400-71
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NIST Pubs
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Created January 1, 1982, Updated May 19, 2023