Skip to main content
U.S. flag

An official website of the United States government

Control of mobile-ion contamination in oxidation ambients for MOS device processing:

Published

Author(s)

Santos Mayo, Richard Y Koyama, Thomas F Leedy
Citation
- NBS IR 77-1404
Report Number
NBS IR 77-1404

Citation

Mayo, S. , Koyama, R. and Leedy, T. (1978), Control of mobile-ion contamination in oxidation ambients for MOS device processing:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NBS.IR.77-1404 (Accessed December 30, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 1978, Updated May 19, 2023