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Physical Measurement Laboratory / Sensor Science Division

Fluid Metrology Group

Index of Semiconductor Process Gases - Ammonia

AMMONIA

M.W. [1]

17.030

N.B.P. [1]

239.82 K

T.P. [1]

195.5K

NH₃

Pc [1]

11.333 MPa

Tc [1]

405.4K

Vc [1]

0.07569 m³/kmol

Note: In the tables, # is used for properties obtained from estimation methods. * and + are used to distinguish between differing data sets within a single column. If no uncertainty is specified, then no uncertainty was provided by the reference.

T K	$$ \frac{C_P^0(T)} {R} $$	Vapor Pressure MPa	B(T) cm³· mol^-1	dB/dT·T cm³· mol^-1	C(T) cm⁶· mol^-2	dC/dT·T cm⁶· mol^-2	λ mW/ (m·K)	η µPa·s
Estimated Uncertainty	2%	0.2%	Densities calculated should be good to 0.5% away from coexistence curve.				1%	3%
Reference	1	-	1	1	1	1	1	1
200	4.114	0.0087	-1028.60	4285.60	-584290.0	-	19.67	6.96
210	4.118	0.0177	-843.29	3354.75	-439050.0	-	19.83	7.23
220	4.127	0.338	-703.65	2678.06	-301310.0	-	20.08	7.52
230	4.139	0.604	-596.21	2176.21	-197260.0	-	20.41	7.82
240	4.153	0.1022	-511.97	1796.88	-125070.0	-	20.83	8.13
250	4.171	0.1649	-444.79	1505.20	-76986.0	-	21.33	8.45
260	4.191	0.2553	-390.37	1277.43	-45675.0	-	21.91	8.78
270	4.213	0.3811	-345.67	1096.93	-25596.0	-	22.57	9.12
280	4.238	0.5509	-308.49	952.03	-12886.0	-	23.30	9.47
290	4.264	0.7744	-277.21	834.21	-4958.4	-	24.11	9.83
300	4.292	1.0617	-250.61	737.37	-111.8	-	24.99	10.19
310	4.321	1.4240	-227.78	656.92	2761.2	-	25.94	10.55
320	4.353	1.8728	-208.02	589.44	4377.9	-	26.95	10.92
330	4.385	2.4205	-190.78	532.32	5201.9	-	28.03	11.30
340	4.419	3.0802	-175.63	483.58	5532.2	-	29.17	11.67
350	4.453	3.8660	-162.23	441.67	5561.4	-	30.37	12.05
360	4.489	4.7929	-150.31	405.32	5412.9	-	31.62	12.43
370	4.526	5.8778	-139.65	373.66	5165.5	-	32.93	12.82
380	4.564	7.1402	-130.06	345.86	4869.1	-	34.29	13.20
390	4.603	8.6045	-121.40	321.32	4554.7	-	35.69	13.59
400	4.643	10.3050	-113.55	299.54	4241.1	-	37.13	13.98
410	4.683	-	-106.39	280.11	3939.6	-	38.61	14.37
420	4.724	-	-99.86	262.70	3656.0	-	40.13	14.75
430	4.766	-	-93.86	247.02	3393.4	-	41.68	15.14
440	4.808	-	-88.35	232.85	3152.6	-	43.26	15.53
450	4.851	-	-83.26	220.00	2933.3	-	44.85	15.92
460	4.894	-	-78.56	208.28	2734.5	-	46.47	16.31
470	4.938	-	-74.19	197.58	2554.9	-	48.11	16.70
480	4.982	-	-70.14	187.77	2393.0	-	49.75	17.09
490	5.026	-	-66.36	178.74	2247.1	-	51.40	17.48
500	5.071	-	-62.83	170.42	2115.8	-	53.05	17.86
550	5.301	-	-48.25	137.02	1631.4	-	61.16	19.78
600	5.535	-	-37.41	113.18	1341.7	-	68.55	21.68
650	5.773	-	-29.08	95.39	1165.0	-	74.51	23.55
700	6.011	-	-22.54	81.68	1055.7	-	78.26	25.39
750	6.249	-	-17.29	70.81	987.8	-	78.96	27.20
800	6.484	-	-13.01	62.00	946.3	-	75.67	29.00
850	6.716	-	-9.47	54.74	922.1	-	67.41	30.79
900	-	-	-	-	-	-	-	-
950	-	-	-	-	-	-	-	-
1000	-	-	-	-	-	-	-	-

References:

Lemmon, E.W. and McLinden, M.O., NIST Standard Reference Database 23: NIST Reference Fluid Thermodynamic and Transport Properties, Version 7.0, National Institute of Standards and Technology, Standard Reference Data Program, Gaithersburg, 2001.

Footnote:

# is used for properties obtained from estimation methods.
* and + are used to distinguish between differing data sets within a single column.

Chemistry, Electronics, Semiconductors, Standards, Reference data and Reference materials

Contacts

Keith A Gillis

keith.gillis@nist.gov

(301) 975-2468
Michael R Moldover

michael.moldover@nist.gov

(301) 975-2459

Created December 16, 2009, Updated March 1, 2023