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NIST Authors in Bold

Displaying 2126 - 2150 of 2608

The Neolithography Consortium

June 1, 2000
Author(s)
James E. Potzick
The role of process simulation in microlithography is becoming an increasingly important part of process control as wafer feature sizes become smaller than the exposure wavelength, because the pattern transfer from photomask to wafer is nonlinear. An

Molecular Measuring Machine Design and Measurements

May 1, 2000
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at the National Institute of Standards and Technology are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer-accuracy, two-dimensional, point-to-point measurements over a 50 mm by 50 mm area

Recent Developments in BIPM Voltage Standard Comparisons

May 1, 2000
Author(s)
D. Reymann, Thomas J. Witt, P. Vrabcek, Yi-hua D. Tang, Clark A. Hamilton, A. S. Katkov, Blaise Jeanneret, O. Power
The BIPM carries out a number of comparisons of DC voltage standards with National Metrology Institutes. These take the form of on-site comparisons of Josephson standards or bilateral comparisons using traveling standards based on Zener diodes. This paper

Laboratory Primary Standards

April 1, 2000
Author(s)
John D. Wright
Commonly used primary calibration techniques for the measurement of liquid and gas flows are described. The techniques described include: static gravimetric and dynamic gravimetric methods for both gases and liquids, liquid piston displacement provers

SEM Sentinel - SEM Performance Measurement System, Part 1

April 1, 2000
Author(s)
Alice V. Ling, Andras Vladar, Bradley N. Damazo, M A. Donmez, Michael T. Postek
This report describes the current design of a system for monitoring the performance of several major subsystems of a scanning electron microscope (SEM). The following subsystems and the associated functional parameters will be monitored. 1) Vacuum system

The Sensitivity of a Method to Predict a Capacitor's Frequency Characteristic

April 1, 2000
Author(s)
S. Avramov, Andrew D. Koffman, Nile M. Oldham, Bryan C. Waltrip
A joint effort between the U.S. Naval Academy and the National Institute of Standard and Technology (NIST) resulted in the development of a method to characterize the capacitance and dissipation factor of a set of commercial standard four terminal-pair

An Overview of Nano-Micro-Meso Scale Manufacturing at the NIST

March 13, 2000
Author(s)
E Amatucci, Nicholas Dagalakis, Bradley N. Damazo, Matthew A. Davies, John Evans, Jun-Feng Song, E C. Teague, Theodore V. Vorburger
The future of nano-, micro- and meso-scale manufacturing operations will be strongly influenced by a new breed of assembly and manufacturing tools that will be intelligent, flexible, more precise, include in-process production technologies and make use of

A Frequency Stabilized Laser Array for Use in Displacement Metrology

February 17, 2000
Author(s)
J Pedulla, R Deslattes, John R. Lawall
We have developed a frequency stabilized laser system to supply light to measure atomic-scale displacements of a stage moved in real time. Each laser in the array provides enough power (~1 mW) for four Michelson interferometers whose accuracy requires a

Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version)

January 31, 2000
Author(s)
J Allgair, C Archie, W Banke, H Bogardus, A Delaporte, Michael T. Postek, J Schlesinger, B Singh, Andras Vladar, A Yanof
The Advanced Metrology Advisory Group (AMAG) comprised of representatives from: the International SEMATECH (ISEMATECH) consortium member companies; the National Institute of Standards and Technology; and ISEMATECH assignees have joined to develop a unified

A Fast Algorithm for Determining the Gaussian Filter Mean Line in Surface Metrology

January 1, 2000
Author(s)
Y B. Yuan, X F. Qiang, Jun-Feng Song, Theodore V. Vorburger
A fast algorithm for assessing the Gaussian filtered mean line was deduced using the central limit theorem and an approximation method. This algorithm only uses simple computer operations such as addition, subtraction and digit shifting, and avoids

A Novel Artifact for Testing Large Coordinate Measuring Machines

January 1, 2000
Author(s)
Steven D. Phillips, Daniel S. Sawyer, Bruce R. Borchardt, David E. Ward, D E. Beutel
We present a high accuracy artifact useful for the evaluation of large CMMs. This artifact can be physically probed by the CMM in contrast to conventional techniques that use purely optical methods such as laser interferometers. The system can be used over

A Simplified Realization for the Gaussian Filter in Surface Metrology

January 1, 2000
Author(s)
Y B. Yuan, Theodore V. Vorburger, Jun-Feng Song, Thomas B. Renegar
A simplified realization for the Gaussian filter in surface metrology is presented in this paper. The sampling function sinu/u is used for simplifying the Gaussian function. According to the central limit theorem, when n approaches infinity, the function
Displaying 2126 - 2150 of 2608