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Search Publications by: Christopher Soles (Fed)

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Displaying 151 - 166 of 166

A Broad Perspective on the Dynamics of Highly Confined Polymer Films

January 1, 2002
Author(s)
Christopher L. Soles, Jack F. Douglas, Wen-Li Wu, H Peng, D W. Gidley
The manner in which the dynamics of a polymer are affected by thin film confinement is of technological significance, impacting thin film applications such as lubricants, adhesives, and chemically amplified photoresists. In this manuscript we use specular

Incoherent Neutron Scattering and the Dynamics of Confined Polycarbonate Films

January 1, 2002
Author(s)
Christopher L. Soles, Jack F. Douglas, Wen-Li Wu, Robert M. Dimeo
Incoherent elastic neutron scattering measurements are performed on thin (1015 to 75 ) polycarbonate films supported on Si wafers. The mean-square atomic displacement is determined by fitting the intensity data to the Debye-Waller factor and we find that

Confinement Effects on the Spatial Extent of the Reaction Front in Ultrathin Chemically Amplified Photoresists

December 1, 2001
Author(s)
D L. Goldfarb, M Angelopoulos, Eric K. Lin, Ronald L. Jones, Christopher Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu
Sub-100 nm lithography poses strict requirements on photoresist material properties and processing conditions to achieve necessary critical dimension (CD) control of patterned structures. As resist thickness and feature linewidth decrease, fundamental

Thin Film Confinement Effects on the Thermal Properties of Model Photoresist Polymers

December 1, 2001
Author(s)
Christopher L. Soles, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
The demand to print increasingly smaller microelectronic device features means that the thickness of the polymer films used in the lithographic processes must decrease. The thickness of these films is rapidly approaching the unperturbed dimensions of the

Characterization of Thin and Ultrathin Polymer and Resist Films

August 1, 2001
Author(s)
D L. Goldfarb, Q Lin, M Angelopoulos, Christopher Soles, Eric K. Lin, Wen-Li Wu
The need for a better understanding of the physicochemical properties of radiation-sensitive thin polymer coatings for lithographic applications is driven by the trend of ever-shrinking pattern dimensions and film thickness, imposed by the semiconductor