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Search Publications by: R Joseph Kline (Fed)

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Displaying 76 - 100 of 174

Classification of Semiconducting Polymeric Mesophases to Optimize Device Post-Processing

August 17, 2015
Author(s)
Chad R. Snyder, Regis J. Kline, Dean M. DeLongchamp, Ryan C. Nieuwendaal, Lee J. Richter, Martin Heeney, Iain McCulloch
Semiconducting polymers form a variety of phases and mesophases that respond differently to post-deposition solvent or thermal treatments. Here it is shown that classification of these materials into their appropriate mesophases can be a useful tool to

Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library

July 1, 2015
Author(s)
John S. Villarrubia, Andras Vladar, Bin Ming, Regis J. Kline, Daniel F. Sunday, Jasmeet Chawla, Scott List
The width and shape of 10 nm to 12 nm wide lithographically patterned SiO2 lines were measured in the scanning electron microscope by fitting the measured intensity vs. position to a physics-based model in which the lines’ widths and shapes are parameters

Tuning Open-Circuit Voltage in Organic Solar Cells with Molecular Orientation

June 24, 2015
Author(s)
Brent Kitchen, Omar Awartani, Regis J. Kline, Terry McAfee, Harald Ade, Brendan T. O'Connor
The role of molecular orientation of a polar conjugated polymer in a polymer-fullerene organic photovoltaic (OPV) cells is investigated. A planar heterojunction (PHJ) OPV cell composed of poly(3-hexylthiophene) (P3HT) and [6,6]-phenyl C61-butyric acid

Template-Polymer Commensurability and Directed Self-Assembly Block Copolymer Lithography

April 15, 2015
Author(s)
Daniel F. Sunday, Regis J. Kline, Elizabeth Ashley, Lei Wan, Kaniyal Patel, Ricardo Ruiz
The directed self assembly (DSA) of block copolymers (BCP’s) is being explored for lithographic patterning of features between 5 nm and 50 nm. The chemoepitaxial approach towards DSA utilizes a chemical template to promote long range ordering of the BCP

Reducing Block Copolymer Interfacial Widths through Polymer Additives

February 10, 2015
Author(s)
Daniel F. Sunday, Regis J. Kline
There is a need to design new materials to achieve smaller pitches and reduced interfacial widths for use in the nanopatterning of block copolymers (BCPs). One option is the use of blends, where the addition of a homopolymer which selectively associates to

In-situ Characterization of Polymer-Fullerene Bilayer Stability

January 8, 2015
Author(s)
Lee J. Richter, Regis J. Kline, Hyun Wook Ro, Chad R. Snyder, Andrew A. Herzing, Sebastian Engmann
A consensus is emerging that every phase present in a bulk heterojunction organic photovoltaic (OPV) device is not material pure. In general, there will exist at least one region characterized by a mixture of donor and acceptor. Significant insights into

Characterization of Buried Structure in Directed Self Assembly Block Copolymers

July 30, 2014
Author(s)
Daniel F. Sunday, Matthew R. Hammond, Chengqing C. Wang, Wen-Li Wu, Dean M. DeLongchamp, Regis J. Kline, Melia Tjio, Joy Cheng, Jed W. Pitera
The directed self assembly (DSA) of block copolymers (BCP) can multiply or subdivide the pitch of a lithographically defined chemical or topological pattern and is a resolution enhancement candidate to augment conventional lithography for patterning sub-20