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Search Publications by: Kin (Charles) Cheung (Fed)

Displaying 126 - 127 of 127

STRESS-INDUCED DEFECT GENERATION IN HFO2/SIO2 STACKS OBSERVED BY USING CHARGE PUMPING AND LOW FREQUENCY NOISE MEASUREMENTS

April 30, 2008

Author(s)

Hao Xiong, Dawei Heh, Shuo Yang, Moshe Gurfinkel, Gennadi Bersuker, D. E. Ioannou, Curt A. Richter, Kin P. Cheung, John S. Suehle

A novel approach combining the low frequency drain current noise and the frequency-dependent charge pumping techniques has been employed to extract the trap densities in both the interfacial SiO2 layer and high-k layer in the n-type MOSFETs with HfO2/SiO2

THE FAST INITIAL THRESHOLD VOLTAGE SHIFT: NBTI OR HIGH-FIELD STRESS

April 27, 2008

Author(s)

Jason P. Campbell, Kin P. Cheung, John S. Suehle

Recent 'NBTI' studies have come to involve very high electric fields, yet these same studies are used to criticize the lower field 'NBTI' models. This study examines both high- and low-field degradation phenomena by monitoring the initial threshold voltage